Microtopological-structure plate flow chamber capable of applying electric and shearing force stimulation
A technology of flat flow chamber and topological structure, which is applied in the field of flat flow chamber to achieve the effect of simple and compact structure
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Embodiment 1
[0026] Depend on figure 1 , figure 2 , image 3 and Figure 4 It can be seen that the plate flow chamber capable of implementing multi-directional electrical stimulation of the present invention is composed of three layers of plates and two layers of gaskets. A rectangular slit 6 is provided and the lower gasket 10 is provided with a flow cell 18 . The width and length of the flow chamber 18 should be much larger than the difference between the thickness of the flow chamber 18 and the thickness of the electrode plate 16 placed therein. The upper plate 2 , the middle plate 5 and the lower plate 11 can be made of materials such as polycarbonate, resin glass or metal, and the upper gasket 3 and the lower gasket 10 can be made of silicone resin or the like. like Figure 5 , Image 6 and Figure 7 It can be seen that the culture liquid enters the triangular diversion groove 4 in the upper gasket 3 from the upper plate 2 and the upper conduit 1, so that the fluid is fully di...
Embodiment 2
[0045] The micro-topological structure on the electrode plate 16 of the present invention is not limited to the micro-grooves provided in Embodiment 1, and micro-protrusions of various shapes such as triangles, quadrangles, pentagons, hexagons or cylinders can also be formed on the silicon wafer. array. Taking a square boss as an example, Figure 10 It is a top view of the electrode plate on the bottom surface of the flow chamber of the flat flow chamber with micro-topography that can apply electrical and shear force stimulation, Figure 11 Yes Figure 10 The electrode plate on the bottom surface of the flow chamber of the flat plate flow chamber with a microtopological structure that can apply electrical and shear force stimulation is shown along the Figure 10 Sectional view of line E-E in . In order to obtain the electrode plate as shown in the figure, a square micro-protrusion array can be formed on a silicon wafer. The side length of the square micro-protrusion platfor...
Embodiment 3
[0047] The electrode plate 16 of the present invention can be prepared as a flat plate with uniform thickness to realize uniform fluid shearing force. The electrode plate 16 can also be prepared as a wedge-shaped plate with a uniform thickness change, so as to realize continuous shearing force. Figure 12 is a cross-sectional view of an electrode plate 16 whose thickness varies uniformly, Figure 13 Yes Figure 12 A side view of the bottom electrode plate 16 is shown. When preparing the electrode plate 16 with a uniform thickness change, the thickness of the PDMS film 23 can be kept uniform, and the thin slice 22 can be made into a wedge shape with an inclination of 5-60°. The slope of the wedge. For the convenience of processing, it is preferable to keep the thickness of the PDMS film 23 uniform, and make the thin slice 22 into a wedge shape with an inclination of 5-60°. And other methods and structure are all identical with embodiment 1 or embodiment 2.
[0048] The usa...
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Abstract
Description
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Application Information
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