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Cleaning apparatus, measurement method and calibration method

A calibration method and cleaning technology, applied in cleaning methods and utensils, cleaning methods using liquids, measuring devices, etc., can solve problems such as difficulty in calibrating measuring devices

Active Publication Date: 2013-05-08
SILTRONIC AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, it is difficult to correct the measuring device with the above method during the operation of the cleaning equipment incorporating the device for measuring the concentration of dissolved nitrogen gas or during the interval between cleaning steps
In other words, it is often difficult to easily and frequently calibrate the devices used to measure the concentration of dissolved nitrogen

Method used

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  • Cleaning apparatus, measurement method and calibration method
  • Cleaning apparatus, measurement method and calibration method
  • Cleaning apparatus, measurement method and calibration method

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Effect test

no. 1 approach

[0053] refer to Figures 1 to 5 A calibration method for calibrating a dissolved nitrogen concentration meter according to the present invention is described. Specifically, for figure 2 In the ultrasonic cleaning device 1 shown, the calibration method according to the invention is a method for calibrating a dissolved nitrogen concentration meter which is the monitoring device 40 .

[0054] Here, if figure 2 As shown, the ultrasonic cleaning device 1 implementing the correction method according to the present invention includes a cleaning tank 20 for keeping a cleaning liquid such as ultrapure water inside, a supply device 10 for supplying the cleaning liquid to the cleaning tank 20, a A connecting tank 21 housing the cleaning tank 20 , an irradiation device 30 provided at the bottom of the connecting tank 21 for irradiating ultrasonic waves, and a monitoring device 40 for monitoring the concentration of dissolved nitrogen in cleaning liquid supplied into the cleaning tank ...

no. 2 approach

[0083] refer to Figure 6 and 7 A method of measuring the concentration of dissolved nitrogen according to the present invention and a cleaning device according to the present invention are described.

[0084] Such as Figure 6 As shown, in the method for measuring the concentration of dissolved nitrogen according to the present invention, the measuring step ( S110 ) is first performed. Specifically, when having Figure 7 In the cleaning device of the shown device configuration, luminescence was observed for the cleaning liquid in the cleaning tank 20 of the ultrasonic cleaning device 1 . Such as Figure 7 As shown, the cleaning device according to the present invention includes an ultrasonic cleaning device 1 , a dark room 50 , a luminescence detection device 60 , an image processing device 61 and a control device 70 . Such as Figure 7 As shown, the ultrasonic cleaning device 1 is located inside a dark room 50 . A luminescence detection device 60 is also arranged faci...

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Abstract

To provide a cleaning apparatus capable of cleaning substrates effectively and stably, a method for calibrating a device for measuring the concentration of a dissolved gas used in the cleaning apparatus, and a measurement method for measuring the concentration of a dissolved gas. A calibration method according to this invention is a calibration method for calibrating a measurement device for measuring a concentration of a gas dissolved in a liquid. In the calibration method, a step (S10) of varying the concentration of the gas dissolved in the liquid, and predetermining, as a reference concentration, a concentration of the gas at which an intensity of luminescence produced when the liquid is irradiated with ultrasonic waves shows a peak, is conducted. Next, a step (S20) of measuring a concentration of the gas in the liquid with the measurement device to be calibrated when the intensity of the luminescence shows a peak by irradiating the liquid with ultrasonic waves while varying the concentration of the gas in the liquid, to determine a measured value of the concentration of the gas, is conducted. A step (S30) of calibrating the measurement device to be calibrated based on the measured value and the reference concentration is conducted.

Description

technical field [0001] The present invention relates to cleaning equipment, measuring methods and calibration methods, and more particularly to equipment for cleaning substrates, methods for measuring the concentration of dissolved gases, such as dissolved nitrogen, in cleaning liquids used in such cleaning equipment , and a method for calibrating a measuring device used in the measuring method. Background technique [0002] In a method of manufacturing a substrate such as a silicon wafer, a method of cleaning the substrate such as a dipping type or a single wafer type is generally carried out to remove organic substances, metal impurities, particles (fine particles), intrinsic oxide film, etc. [0003] Among the methods of cleaning substrates, various cleaning methods are used to suit their purpose. Especially in the case of removing foreign matter such as particles by immersion cleaning, in which the substrate is immersed in a cleaning solution contained in a cleaning ta...

Claims

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Application Information

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IPC IPC(8): H01L21/66H01L21/67
CPCG01N21/71G01H9/00G01N21/274B08B3/12G01N21/70G01N2021/8416G01N29/2418H01L22/00H01L21/302
Inventor 榛原照男森良弘久保悦子内部真佐志
Owner SILTRONIC AG
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