Method for manufacturing passivation layer on pixel electrode, liquid crystal display and manufacturing method thereof

A technology of liquid crystal display and manufacturing method, which is applied to instruments, circuits, electrical components, etc., can solve problems such as inability to display and abnormal display of TFT products, and achieve the effects of improving yield, ensuring good electrical contact, and reducing losses
CN103117249AInactive Publication Date: 2013-05-22TRULY SEMICON
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TRULY SEMICON
Publication Date
2013-05-22
Estimated Expiration
Not applicable · inactive patent

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Abstract

An embodiment of the invention discloses a method for manufacturing passivation layer on a pixel electrode, a liquid crystal display and a manufacturing method thereof. The method for manufacturing a passivation layer on the pixel electrode includes: forming a passivation layer in a first thickness on the surface of a pixel electrode via process gas in a first flow volume under first power; forming a passivation layer in a second thickness on the surface of passivation layer in the first thickness via process gas in a second flow volume under second power, wherein the first power is smaller than the second power, the first flow volume is smaller than the second flow volume, the first thickness is smaller than the second thickness, the passivation layer in the first thickness and the passivation layer in the second thickness are compact, so that when through holes are drilled in the passivation layers, undercut is avoided, good electric connection between a top electrode and a pixel electrode is guaranteed, the problem that a TFT (thin film transistor) product displays abnormally or cannot display due to contact breakage between the top layer ITO (indium tin oxide) film and the pixel ITO film is solved, product rate of the TFT products is improved.
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Description

technical field

[0001] The invention relates to the technical field of liquid crystal display manufacturing, in particular to a method for manufacturing a passivation layer on a pixel electrode, a liquid crystal display and a manufacturing method thereof. Background technique

[0002] Such as Figure 1-Figure 3 As shown, in the production process of TFT products, after the pixel ITO film 01 is completed, it is necessary to use chemical vapor deposition equipment to form a passivation layer 02 on the surface of the pixel ITO film 01; Form a via hole 03 in the passivation layer 02; finally form a top layer ITO04 on the surface of the passivation layer 02; wherein, the top layer ITO04 is electrically connected to the pixel ITO film 01.

[0003] However, in the manufacturing process of traditional TFT products, during the process of forming the via hole 03, an undercut, also known as an inverse angle or a chamfer, will be formed at the via hole 03 in the passivation layer 02, re...

Claims

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