Chemical vapor deposition solid precursor continuous supply system

Abstract

The invention discloses a chemical vapor deposition solid precursor continuous supply system composed of a vacuum chamber, a vacuum set, a chemical tail gas adsorber and a chemical tail gas processor, wherein a vacuum isolation chamber is arranged at the upper part of the vacuum chamber; a crucible and a heating body are embedded in the vacuum chamber; an air inlet is arranged on the outer wall of the vacuum chamber and is communicated with a controllable solid precursor volatilization device; a vacuum opening is arranged at the lower end of the vacuum chamber and is communicated with the chemical tail gas adsorber; and the chemical tail gas adsorber is communicated with the chemical tail gas processor via the vacuum set. According to the system, solid precursor can be continuously supplied and the volatilization temperature of the solid precursor can be accurately controlled by adjusting the position of the material in a furnace via a servo mechanism, so that the flow rate of the solid precursor can be accurately controlled; the supply system is simple in structure and easy to be compatible with common chemical vapor deposition equipment; and the controllable volatility, the continuity and the uniformity of the solid precursor in a chemical vapor deposition process are effectively increased and the implementation of the deposition of infusible metal carbide coatings or matrixes is ensured.

Description

technical field [0001] The invention relates to a continuous supply system of a chemical vapor deposition solid precursor, belonging to the technical field of casting and experimental equipment. Background technique [0002] In recent years, due to the increase in the use temperature requirements of aerospace vehicles, refractory metal carbides have become more and more widely used in fiber-reinforced ceramic matrix composites as modified materials, and even as the main matrix material. [0003] Refractory metal carbides, such as tungsten carbide, titanium carbide, niobium carbide, zirconium carbide, hafnium carbide and tantalum carbide, have high hardness, good wear resistance, extremely high melting point and good high temperature mechanical properties. The field of technology industry has a wide range of applications. The application of refractory metal carbide is usually used as high temperature resistant coating and wear-resistant tool coating; its preparation methods ...

AI Technical Summary

Problems solved by technology

Most of the refractory metal halide precursors are solid, and the supply of the precursor is realized by sublimation at high temperature. This method is affected by the temperature and the surface area of ​​the halide powder, and it is difficult to achieve uniform and continuous supply, which limits the carbonization of refractory metals. Preparation of coatings and substrates

In the existing published literature, researchers at home and abroad use the "lead screw" transmission structure to evenly push the refractory metal precursor powder into the deposition furnace, and use the temperature sublimation powder of the deposition furnace to obtain a continuous precursor supply. However, this method is difficult to precisely control the flow field in the deposition furnace, and it is also difficult to obtain a uniform refractory metal carbide coating or matrix

Images