Color imaging method based on photosensitive composite medium grid metal oxide semiconductor field effect transistor (MOSFET) detector
A composite medium and color imaging technology, which is applied in image signal generators, radiation control devices, etc., can solve problems such as color confusion, aggravate color confusion, and affect imaging quality
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[0050] Incident photons penetrate to different depths in silicon with different wavelengths, figure 1 The penetration depth of light in silicon is shown as a function of wavelength. As shown in the figure, blue light (wavelength 400-490 nanometers) is mainly absorbed in silicon at 0.2-0, 5 microns depth, green light (wavelength 490-575 nanometers) is mainly absorbed at 0.5-1.5 microns in silicon Absorption, red light (wavelength 575 to 700 nanometers) is mainly absorbed in silicon at 1.5 to 3 microns.
[0051]When the voltage applied to the gate of the MOSFET is a pulse voltage, the MOSFET will work in a deep depletion state. At this time, the depletion layer at the interface between the underlying dielectric layer and the P-type silicon substrate will vary with the voltage applied to the gate. Different, the relationship between the depth of the depletion layer and the voltage applied to the gate is as follows:
[0052] W = ϵ ...
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