Automated mask management system and method

A technology of automatic management and production management system, applied in the field of automatic management system of masks, can solve problems such as low yield rate, and achieve the effect of reducing error rate, facilitating data analysis, and reducing the scope of influence

Active Publication Date: 2013-06-26
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this invention still fails to overcome the problem of low yield due to masks being used on the wrong machine

Method used

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  • Automated mask management system and method
  • Automated mask management system and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0055] figure 1 It is a schematic structural diagram of the automatic management system of the mask according to Embodiment 1 of the present invention; as shown in the figure, the automatic management system of the mask includes a production management module, a mask management module, a process module, and a mask The processing module and the mask storage module, meanwhile, the production management module interacts with the mask management module, the process module, the mask processing module and the mask storage module through EAP and the server to interact with the data information of the mask .

[0056] Among them, the production management module is an automated production management system; the mask management module includes a data storage unit and a read / write unit, and the data storage unit stores the current data information of several masks; the process progress module includes a plurality of photolithography units and multiple detection units; the mask plate pro...

Embodiment 2

[0062] figure 2 It is a schematic diagram of the process structure of the mask in the automatic management system of the mask according to Embodiment 2 of the present invention; figure 2 As shown, when the photolithography unit needs the mask plate to carry out the photolithography process, the automatic production management system retrieves the data information of the mask plate from the data storage unit through the read / write unit according to the properties of the photolithography unit, and retrieves When the state of the data information of the mask plate is identified as the storage state, the storage time T under the storage state is judged. If the storage time T>12 months, such as the storage time is 13 months, 14 months, 15 months Months, etc., according to the judgment of the engineer, transfer the mask to the scrap unit for scrapping, and mark the current state of the mask as scrap; or continue to store the mask, and the current state of the mask is storage Stat...

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PUM

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Abstract

The invention discloses an automated mask management system and method. The system comprises a production management module, a mask management module, a process execution module, a mask processing module and a mask storage module, wherein the production management module can be in data interaction with the mask management module, the process execution module, the mask processing module and the mask storage module respectively through an EAP (Equipment Automatic Program) and a server. According to the system and the method, disclosed by the invention, a mask can be accurately applied to a corresponding photoetching machine, a corresponding photoetching process and a corresponding photoetching product, so that the error ratio caused by human factors is reduced, the range of influence caused after problems occur is reduced, the use conditions of the mask can be effectively monitored, and the mask trace tracking is facilitated; and thus, the subsequent data analysis is facilitated, the feedback speed is accelerated, and then, the management is timesaving and laborsaving, so that the process production cost is reduced, and the problem of yield caused by human errors is solved.

Description

technical field [0001] The invention relates to an automatic management system, in particular to a mask plate automatic management system and method. Background technique [0002] The semiconductor manufacturing process involves hundreds of detailed and complex processes, and devices must be produced in accordance with strict process production conditions. The semiconductor manufacturing process includes photolithography process, etching process, deposition process, implantation process and chemical mechanical polishing process, etc. In the entire manufacturing process, the most complicated process that has the greatest impact on device yield is the photolithography process, and the photolithography process It is necessary to use a mask for lithography. The mask is an auxiliary device used to project complex circuit patterns onto the wafer surface through the lithography process. Different masks must be assigned to different machines or equipment, and the corresponding Ther...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
Inventor 马兰涛陈毅俊朱骏
Owner SHANGHAI HUALI MICROELECTRONICS CORP
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