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Boron diffusion furnace tube tail gas treatment method and device

A technology of tail gas treatment and diffusion furnace, which is applied in the directions of post-treatment, diffusion/doping, chemical instruments and methods, etc. It can solve the problems of blocked tail gas pipes, increase the number of maintenance and cleaning, and reduce the utilization rate of equipment, so as to reduce the production cost of enterprises , Reduce the number of maintenance and cleaning, improve the effect of processing speed

Active Publication Date: 2013-07-10
YINGLI ENERGY CHINA
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AI Technical Summary

Problems solved by technology

[0003] The main components of boron diffusion tail gas are boron oxide and borosilicate glass. These substances are in the form of white powder. With the progress of the diffusion process, a large amount of white powder will block the tail gas pipe, so that the tail gas cannot be discharged, and the process is terminated.
The current main method is to monitor the air pressure compensation of the furnace tube. The air pressure compensation will become smaller and smaller with the blockage of the exhaust pipe. When the air pressure compensation is low to a certain value, the process will stop, and the exhaust gas part will be manually removed and put into the water tank. Flushing, this also completes the cleaning of the tail gas part, ensuring the stable operation of the process, but this treatment method not only needs to terminate the process, but also increases the maintenance and cleaning frequency of the furnace tube tail gas treatment part, thus increasing the maintenance per unit time The increase in cleaning times and maintenance cleaning times also reduces the utilization rate of equipment, greatly reduces the speed of boron tail gas treatment, and increases the labor costs and maintenance and cleaning costs of enterprises.

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Embodiment Construction

[0022] Hereinafter, the present invention will be described in detail with reference to the drawings and examples. It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other.

[0023] According to an embodiment of the present invention, see figure 1 and figure 2 As shown, the boron diffusion furnace tube tail gas treatment method comprises that the boron tail gas in the furnace tube 10 is discharged into the tail gas pipe 20; the water-carrying gas is passed into the tail gas pipe 20, so that the boron tail gas in the tail gas pipe is dissolved in the water-carrying gas moisture and exits the tailpipe along with the water-carrying gas. According to the boron diffusion furnace tube tail gas treatment equipment of the present invention, the water-carrying gas is passed into the tail gas pipe 20, so that the boron tail gas in the tail gas pipe 20 can be dissolved in the moi...

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Abstract

The invention discloses a boron diffusion furnace tube tail gas treatment method and a device. The boron diffusion furnace tube tail gas treatment method comprises the following steps of: exhausting a boron tail gas in a furnace tube (10) into a tail gas tube (20); introducing water-carrying gases into the tail gas tube (20), so that the boron tail gas in the tail gas tube (20) is dissolved into the water-carrying gases and is exhausted out of the tail gas tube (20) together with the water-carrying gases. According to the boron diffusion furnace tube tail gas treatment method and device provided by the invention, the treatment speed of boron diffusion furnace tube tail gas can be improved; the maintaining and cleaning times of the boron diffusion furnace tube tail gas part per unit of time is reduced; and the enterprise production cost is lowered.

Description

technical field [0001] The invention relates to the field of boron diffusion furnace tube tail gas treatment, in particular to a boron diffusion furnace tube tail gas treatment method and processing equipment. Background technique [0002] Crystalline silicon solar cells have been widely used in various fields, and their good stability and mature process flow are the basis for their large-scale application. How to further improve efficiency and reduce costs is the basic goal of domestic and foreign technical research. With the development of process technology, N-type crystalline silicon cells are getting more and more attention from the market because of their low cost and high efficiency. Among them, the boron diffusion process (the formation of P / N junctions on the surface of N-type silicon wafers after diffusion) is an important part of the production process. Therefore, ensuring the stability of the boron diffusion process and reducing the production cost of this proce...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B31/16
Inventor 王英超熊景峰胡志岩李高非赵文超
Owner YINGLI ENERGY CHINA