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Device for online measuring stoichiometric proportions and ingredient masses of PLD (Pulsed Laser deposition) film

A stoichiometric ratio and mass technology, applied in electromagnetic measurement devices, electrical/magnetic thickness measurement, material excitation analysis, etc. Build simple effects

Active Publication Date: 2015-01-07
DALIAN UNIV OF TECH
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

Disadvantages: The self-absorption effect is not considered, which will affect the measurement results; all spectral lines need to be analyzed, and the workload is relatively large

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  • Device for online measuring stoichiometric proportions and ingredient masses of PLD (Pulsed Laser deposition) film
  • Device for online measuring stoichiometric proportions and ingredient masses of PLD (Pulsed Laser deposition) film
  • Device for online measuring stoichiometric proportions and ingredient masses of PLD (Pulsed Laser deposition) film

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Embodiment Construction

[0020] The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.

[0021] refer to figure 1 , the present invention is a device for online measurement of the stoichiometric ratio and the quality of each component of a PLD film, including: a pulse deposition coating system (PLD), a laser-induced breakdown spectroscopy (LIBS) measurement system, a quartz crystal microbalance (QCM) measurement system, data analysis system.

[0022] The pulse laser deposition coating (PLD) system is used to deposit a thin film with a specific function on the substrate, including: a vacuum chamber 1, a pulse laser 4, a rotatable target stage 6, a target material 7, a rotatable substrate stage 8, a substrate 9, a A focusing lens 10; the outer wall of the vacuum chamber 1 is equipped with a vacuum pump group 11, a vacuum gauge 14, an air inlet 16, and a first quartz window 12, which are used to form the required ambient gas conditions for ...

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Abstract

The invention relates to the field of pulsed laser deposition film coating and discloses a device for online measuring stoichiometric proportions and ingredient masses of a PLD (Pulsed Laser deposition) film. The device comprises a pulsed laser deposition (PLD) film coating system, a laser induced breakdown spectrometry (LIBS) measuring system and a quartz crystal microbalance (QCM) measuring system. The device disclosed by the invention can be used for online measuring the stoichiometric proportions and ingredient masses of the pulsed laser deposition film in situ on the basis of the pulsed laser deposition film coating technology, the laser induced breakdown spectrometry technology and the quartz crystal microbalance technology, no interference is generated on the film coating process, the construction of the device is simple, and the device is easy to operate; and the device is suitable to be applied in the field of pulsed laser deposition film coating.

Description

technical field [0001] The invention relates to the field of pulsed laser deposition and coating, in particular to a device for online measurement of the stoichiometric ratio and the quality of each component of a PLD film. Background technique [0002] Pulsed laser deposition (PLD) is used to prepare thin films. The process is usually to focus a beam of pulsed laser and project it onto the target. The high energy density of the laser will instantly ablate the component materials in the irradiated area on the target, and then ablate The matter will be preferentially transmitted along the normal direction of the target, forming a plasma plume on the target surface. The ablation is transported towards the substrate in the space, and condenses, nucleates, grows on the surface of the substrate, and finally obtains the desired thin film. During the entire growth process, a certain gas at a certain pressure can usually be filled in the chamber, for example, a certain amou...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N5/02G01N21/63G01B7/06
Inventor 丁洪斌吴兴伟李聪张辰飞
Owner DALIAN UNIV OF TECH
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