Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Package substrate and production method thereof

A technology for encapsulating substrates and substrates, applied in multilayer circuit manufacturing, semiconductor/solid-state device manufacturing, electrical components, etc., can solve problems such as abnormal structure of encapsulating colloid, delamination of surface treatment layer 14, and affecting product reliability. Product reliability, avoiding product scrapping, and avoiding the effect of delamination of the insulating protective layer

Active Publication Date: 2013-07-17
UNIMICRON TECH CORP
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, in the existing manufacturing method of the packaging substrate 1, after removing the external portion 121, a depression h appears on the surface of the insulating protection layer 13. When a chip is placed on the insulating protection layer 13 in the subsequent process, the stress will be will concentrate around the depression h, causing the insulating protective layer 13 to crack around the depression h, thereby affecting the reliability of the product, and in severe cases, the product needs to be scrapped
[0009] In addition, when the encapsulant is formed in the subsequent process, the adhesive material is easy to flow into the depression h, so the flow direction of the adhesive material cannot be controlled, resulting in an abnormal phenomenon in the structure of the encapsulant
[0010] Furthermore, in the existing manufacturing method of the packaging substrate 1, the surface treatment layer 14 is formed first, and then the insulating protection layer 13 is formed, so the insulating protection layer 13 will cover part of the material of the surface treatment layer 14, resulting in the insulating protection layer 13 It is easy to delaminate at the surface treatment layer 14 due to poor combination with the surface treatment layer 14

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Package substrate and production method thereof
  • Package substrate and production method thereof
  • Package substrate and production method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0048] The implementation of the present invention will be described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

[0049] It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to match the content disclosed in the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. Limiting conditions, so there is no technical substantive meaning, any modification of structure, change of proportional relationship or adjustment of size, without affecting the effect and purpose of the present invention, should still fall within the scope of the present invention. The disclosed technical content must be within the scope covered. At the same time, terms such as "above" and "a" quot...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a package substrate and a production method thereof. The production method of the package substrate includes forming a circuit layer which comprises an electrical contact pad and an external connection portion on the surface of a substrate body; forming a first insulating protective layer on the substrate body and exposing the electrical contact pad and the external connection portion; electrically connecting an electroplating device with the external connection portion to form a surface processing layer on the electrical contact pad through electroplating; removing the external connecting portion; and forming a second insulating protective layer on an exposed surface and the first insulating protective layer of the substrate body and exposing the electrical contact pad. Smoothness of surfaces of the insulating protective layers is maintained and reliability of products is improved due to the insulating protective layers which are formed through two times.

Description

technical field [0001] The invention relates to a packaging substrate and its manufacturing method, especially to a packaging substrate for carrying semiconductor chips and its manufacturing method. Background technique [0002] With the development of multi-functional and high-performance electronic products, different packaging types have been developed for semiconductor packaging structures, such as Flip Chip Package and Wire Bond. In the current technology, electrode pads (electronic pads) are arranged on the surface of the semiconductor integrated circuit (IC) chip, and the packaging substrate also has corresponding electrical contact pads, and solder bumps ( flip-chip) or gold wires (wire bonding) to electrically connect the chip to the packaging substrate. Generally, a surface treatment layer is formed on the electrical contact pads of the package substrate to prevent oxidation, and then the subsequent wire bonding or flip chip process is performed. [0003] see Fi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/48H05K3/46H01L23/498H05K1/02
Inventor 刘智文游志勋
Owner UNIMICRON TECH CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products