Covering sheet with bright stratum pattern and manufacturing method of covering sheet
A manufacturing method and rock formation technology, applied in the field of covering parts and its manufacture, can solve problems such as difficulty in obtaining a bright appearance, low hardness and wear resistance of products, and poor simulation effect of rock formation textures
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Embodiment 1
[0038] A substrate 11 is provided. The base body 11 is made of stainless steel.
[0039] The base 11 is polished, and the glossiness of the base 11 after polishing is 96.
[0040] Form the sand surface region 113 by chemical etching: form a shielding layer on the first surface 112 of the substrate 11, the shielding layer is formed with a hollow area, and the hollow area corresponds to the mirror area 115; provide an etching solution, in the etching solution Contains 20g / L Fe 2+ , 150g / L of Fe 3+ and 0.6 mol / L hydrochloric acid (HCl); heating the etching solution to a temperature of 45° C., and treating the substrate 11 formed with a masking layer in the etching solution for 10 seconds; taking out the substrate 11 and removing the masking layer. The roughness (Ra) of the sand surface region 113 is 0.8 nm.
[0041] Sputtering color layer 15: vacuumize coating chamber 20 to 4.0×10 -3 Pa, with argon as the working gas, the argon gas with a flow rate of 180 sccm is passed into...
Embodiment 2
[0044] A substrate 11 is provided. The base body 11 is made of aluminum alloy.
[0045] The base 11 is polished, and the glossiness of the base 11 after polishing is 97.
[0046] A sand surface area 113 is formed on the first surface 112 by means of a laser. The roughness (Ra) of the sand surface region 113 is 0.4 nm.
[0047] Sputtering color layer 15: vacuumize coating chamber 20 to 4.0×10 -3 Pa, with argon as the working gas, the argon gas with a flow rate of 200 sccm is passed into the coating chamber 20, and acetylene is used as the reaction gas, and the acetylene with a flow rate of 200 sccm is passed into the coating chamber 20; the setting of the first target material 22 The power is 16kw, the bias voltage applied to the substrate 11 is -120V, the coating temperature is 130° C., and the coating time is 60 minutes. The color layer 15 is a CrC layer with a thickness of 3 μm.
[0048] Sputtering transparent layer 17: set the power of the second target 23 to 16kw; use...
Embodiment 3
[0051] A substrate 11 is provided. The material of the base body 11 is magnesium alloy.
[0052] The base 11 is polished, and the glossiness of the base 11 after polishing is 96.
[0053] A sand surface area 113 is formed on the first surface 112 by means of a laser. The roughness (Ra) of the sand surface region 113 is 0.5 nm.
[0054] Sputtering color layer 15: vacuumize coating chamber 20 to 4.0×10 -3 Pa, with argon as the working gas, the argon gas with a flow rate of 220 sccm is passed into the coating chamber 20, and acetylene is used as the reaction gas, and the acetylene with a flow rate of 220 sccm is passed into the coating chamber 20; the setting of the first target material 22 The power is 17kw, the bias voltage applied to the substrate 11 is -120V, the coating temperature is 130°C, and the coating time is 120min. The color layer 15 is a CrC layer with a thickness of 4 μm.
[0055] Sputtering transparent layer 17: set the power of the second target 23 to 17kw; ...
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