Surface contact magneto-rheological flat polishing device and method with uniform magnetic field
A polishing device and a technology of uniform magnetic field, applied in the field of magnetorheological polishing, can solve the problems of rapid magnetic field decay, difficult to uniform polishing, and difficult to demagnetize, and achieve the effects of simplifying equipment structure, improving polishing efficiency, and reducing complexity.
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Embodiment 1
[0032] see figure 1 and image 3 , the surface contact magnetorheological planar polishing device using a uniform magnetic field includes a polishing head, a polishing groove 1 fixed on the main shaft 8, and a magnetic pole 10 located below the polishing groove 1; the polishing head includes a workpiece shaft 6, a fixed The non-magnetic holder 3 at the lower end of the workpiece shaft 6 is provided with a soft magnetic plate 5 between the non-magnetic holder 3 and the workpiece shaft 6; the polishing head is positioned above the polishing groove 1; A uniform magnetic field 11 exists between the magnetic plates 5 , that is, the magnetic poles 10 are aligned with the soft magnetic plates 5 ; the polishing tank 1 is filled with a magnetorheological fluid 2 .
[0033] Wherein, a polishing pad 9 is provided at the inner bottom of the polishing tank 1 . The magnetic pole 10 is a permanent magnet. The workpiece shaft 6 is fixed on the vertical mobile platform. The soft magnetic p...
Embodiment 2
[0035] see figure 1 and image 3, the surface contact magnetorheological planar polishing device using a uniform magnetic field includes a polishing head, a polishing groove 1 fixed on the main shaft 8, and a magnetic pole 10 located below the polishing groove 1; the polishing head includes a workpiece shaft 6, a fixed The non-magnetic holder 3 at the lower end of the workpiece shaft 6 is provided with a soft magnetic plate 5 between the non-magnetic holder 3 and the workpiece shaft 6; the polishing head is positioned above the polishing groove 1; A uniform magnetic field 11 exists between the magnetic plates 5 , that is, the magnetic poles 10 are aligned with the soft magnetic plates 5 ; the polishing tank 1 is filled with a magnetorheological fluid 2 .
[0036] Wherein, a polishing pad 9 is provided at the inner bottom of the polishing tank 1 . The magnetic pole 10 is an electromagnet. The workpiece shaft 6 is fixed on the vertical mobile platform. The soft magnetic plat...
Embodiment 3
[0038] see Figure 1 to Figure 3 , a polishing method based on the polishing device described in embodiment 1, comprising the steps of:
[0039] (1) Install the workpiece 4 on the lower surface of the non-magnetic holder 3, start the spindle 8, and make the spindle 8 drive the polishing tank 1 to rotate;
[0040] (2) The polishing head moves downward vertically, and the permanent magnet moves vertically upward, adjusting the distance between the soft polishing head and the permanent magnet, so that the workpiece 4 is in contact with the magnetorheological fluid 2; when the polishing head is close to the permanent magnet, the soft magnetic The plate 5 is close to the permanent magnet, and the soft magnetic plate 5 is magnetized by the permanent magnet, forming a uniform magnetic field 11 with a magnetic field strength of 2000-5000 gauss and a magnetic pole gap of 30mm between the soft magnetic plate 5 and the permanent magnet; the uniform magnetic field 11 makes the flow The m...
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