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Test system for extreme ultraviolet radiation material

A material testing, extreme ultraviolet technology, applied in the direction of analyzing materials, material analysis by optical means, measuring devices, etc., can solve problems such as attenuation of EUV radiation energy

Active Publication Date: 2013-10-23
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

There are multiple sets of mirrors in such a structural arrangement, and the spot characteristics and irradiated energy on the sample are obtained indirectly through reflection calculations, and there are certain measurement errors
In addition, the existence of multiple sets of mirrors can attenuate the EUV radiation energy that is finally irradiated on the sample

Method used

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  • Test system for extreme ultraviolet radiation material
  • Test system for extreme ultraviolet radiation material
  • Test system for extreme ultraviolet radiation material

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Embodiment Construction

[0025] The present invention proposes a test system for extreme ultraviolet radiation materials, which can provide extreme ultraviolet radiation and detect characteristics such as spectral distribution, spot size, and irradiation energy density of extreme ultraviolet radiation. The change of extreme ultraviolet radiation damage of different samples was obtained. In addition, the present invention also proposes a radiation energy calculation process for the extreme ultraviolet radiation material testing system.

[0026] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0027] figure 2 It is a structural schematic diagram of an embodiment of the extreme ultraviolet radiation material testing system of the present invention. Such as figure 2 As shown, it includes EUV light so...

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Abstract

The invention discloses a test system for extreme ultraviolet radiation material. The system comprises a EUV light source chamber, which is used for accommodating a EUV light source which is used to give off wide spectrum near soft X-ray; a filter plate chamber, which is used for placing a filter plate which is used to filter the wide spectrum near soft X-ray to narrow spectrum EUV radiation; a collecting mirror chamber, which is used for placing a collecting mirror which is used for gathering the EUV radiations to a sample chamber; a spectrum detection chamber, which is used for installing a reflector and a spectrometer, wherein the reflector is used to reflect the EUV radiations from the collecting mirror chamber to the spectrometer; and a sample chamber, which is used for accommodating a sample to be tested, a CCD and an energy meter and can make the sample, the CCD and the energy meter move in turn to a same position where the sample, the CCD and the energy meter can be radiated by EUV radiation. The test system can obtain extreme ultraviolet radiation damage conditions of various samples.

Description

technical field [0001] The invention belongs to the technical field of material performance testing, in particular to an extreme ultraviolet (EUV) radiation material testing system, which is used for testing the EUV radiation damage of materials. Background technique [0002] Extreme ultraviolet (EUV) lithography technology is the next-generation lithography machine technology after 193nm immersion lithography technology. Since extreme ultraviolet radiation is strongly absorbed by almost all substances (including air), EUV lithography machine The system must be placed in a vacuum environment. The materials used in the key components of the EUV lithography system must ensure that they do not have the harmful characteristics of EUV radiation damage under EUV radiation and vacuum environments. And some materials will produce radiation damage corrosion under the action of EUV radiation. [0003] In order to guide the selection of materials and processes in the design process o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/84
Inventor 陈进新吴晓斌谢婉露张罗莎罗艳王魁波
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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