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Idler wheel die for rolling type nanometer imprinting

A nano-imprinting and roller technology, applied in the directions of marking, instruments, display devices, etc., to achieve the effects of high flexibility, shortened curing time, and strong adaptability

Inactive Publication Date: 2013-11-20
QINGDAO BONA PHOTOELECTRIC EQUIP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem that the existing UV-curable roll-type nanoimprint is difficult to be used for patterning of non-transparent substrates. By providing a new type of roller mold for roll-type nano-imprint, the UV-curable roll-type nanoimprint can be realized. Imprinting on non-transparent substrates

Method used

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  • Idler wheel die for rolling type nanometer imprinting

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Embodiment Construction

[0029] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.

[0030] The present invention takes a roller mold for roller-to-plane nanoimprinting as a specific embodiment.

[0031] The size of the roller mold: 150mm in diameter and 200mm in length. The feature graph is a one-dimensional grating structure.

[0032] The roller mold for UV curing roller nanoimprinting of the present invention includes: a characteristic structure layer 1 , an adhesive layer 2 , a quartz roller 3 , a collimator lens 4 , and a UV light source 5 . Such as figure 1 As shown, the characteristic structure layer 1 is wrapped and adhered on the outer surface of the quartz cylinder 3 through the adhesive layer 2, and the collimating lens 4 is placed between the quartz cylinder 3 and the UV light source 5, and the distance from the UV light source 5 is 10 mm. The light source 5 is placed on the central axis of the quartz cylinder 3...

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Abstract

The invention relates to a novel idler wheel die for rolling type nanometer imprinting to realize imprinting of UV solidification rolling type nanometer imprinting to non-transparent substrates. The novel idler wheel die comprises a transparent hollow roller; the transparent hollow roller has UV photopermeability and is used for imprinting; a feature structure layer, which has UV photopermeability, is fixed on the outer surface of the roller; a feature graph of the feature structure layer, which is to be copied, is composed of a convex feature and a concave feature; a collimating lens is arranged on the inner surface of the roller; a high reflection coating is coated on the inner surface of the collimating lens; a slit is formed in an area requiring exposure; the collimating lens is arranged between the quartz roller and a UV light source; the collimating lens focalizes the UV light beams emitted by the UV light source to the central area of the slit, and uniform and consistent light beams are obtained; an imprinting material is exposed and solidified through the slit of the collimating lens; the UV light source is arranged on the central axis in the roller.

Description

technical field [0001] The invention relates to a mold for ultraviolet curing nano-imprinting, in particular to a roller mold for rolling-type nano-imprinting, belonging to the technical field of micro-nano manufacturing and moulds. Background technique [0002] Roll-type nanoimprinting is a new large-area continuous micro-nano patterning method, which has the characteristics of high resolution, low cost and ultra-high productivity, especially its unique advantages of continuous patterning, which can be used for hard Patterning of (rigid) substrates (substrates) can also be used for patterning of flexible (roll-form) substrates. Roll-type nanoimprinting has been used to mass-produce anti-reflective films and coatings, nanopatterning of sapphire substrates (NPSS), anti-reflective and self-cleaning glass, OLEDs, RF devices, electronic paper, displays, solar panels, etc. In many fields, this technology has been regarded as the most promising micro-nano manufacturing method for...

Claims

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Application Information

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IPC IPC(8): G09F7/00
Inventor 兰红波
Owner QINGDAO BONA PHOTOELECTRIC EQUIP
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