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A kind of secondary corrosion texturing process on the surface of solar cells

A technology of solar cells and corrosion, which is applied in the direction of sustainable manufacturing/processing, circuits, electrical components, etc., can solve the problems of high silicon wafer thickness requirements, increased costs, complex processes, etc., and achieve uniform and stable texturing and cost savings Effect

Inactive Publication Date: 2016-02-24
JIANGSU ST SOLAR
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Mechanical grooving is not suitable for thin-substrate solar cells due to its large groove depth and high requirements on the thickness of silicon wafers, which increases the cost in disguise; although the honeycomb textured structure technology has excellent light-trapping effects, the process is complicated and unsuitable. Industrial production; the uniformity of texturing on large-area silicon wafers by electrochemical etching is unstable

Method used

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  • A kind of secondary corrosion texturing process on the surface of solar cells

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Experimental program
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Effect test

Embodiment 1

[0038] A secondary corrosion texturing process on the surface of a solar cell, comprising the steps of:

[0039] Step 1: Place the wafer in HNO-rich 3 HF and HNO 3 A corrosion is carried out in the mixed solution; among them, HF and HNO 3 The ratio of the mixed solution is HF:HNO 3 =1:5, corrosion temperature: 19°C, corrosion time: 2 minutes;

[0040] Step 2: Soak the once-etched silicon wafer in NaOH solution; the concentration of NaOH solution is 0.5%, and the soaking time is 30 seconds;

[0041] Step 3: Rinse the silicon wafer soaked in step 2 with deionized water;

[0042] Step 4: Place the wafer in HF-rich HF and HNO 3 The secondary corrosion is carried out in the mixed solution; among them, HF and HNO 3 The ratio of the mixed solution is HF:HNO 3 =50:1, corrosion temperature: 19°C, corrosion time: 3 minutes.

[0043] Step 5: Soak the silicon wafer after secondary etching in NaOH solution to remove porous silicon; wherein the concentration of NaOH solution is 0.5%...

Embodiment 2

[0048] A secondary corrosion texturing process on the surface of a solar cell, comprising the steps of:

[0049] Step 1: Place the wafer in HNO-rich 3 HF and HNO 3 A corrosion is carried out in the mixed solution; among them, HF and HNO 3 The ratio of the mixed solution is HF:HNO 3 =1:3, corrosion temperature: 25°C, corrosion time: 1 minute;

[0050] Step 2: Soak the once-etched silicon wafer in NaOH solution; the concentration of NaOH solution is 1%, and the soaking time is 20 seconds;

[0051] Step 3: Rinse the silicon wafer soaked in step 2 with deionized water;

[0052] Step 4: Place the wafer in HF-rich HF and HNO 3 The secondary corrosion is carried out in the mixed solution; among them, HF and HNO 3 The ratio of the mixed solution is HF:HNO 3 =80:1, corrosion temperature: 15°C, corrosion time: 2 minutes.

[0053] Step 5: Soak the silicon wafer after secondary etching in NaOH solution to remove porous silicon; wherein the concentration of NaOH solution is 1%, and...

Embodiment 3

[0058] A secondary corrosion texturing process on the surface of a solar cell, comprising the steps of:

[0059] Step 1: Place the wafer in HNO-rich 3 HF and HNO 3 A corrosion is carried out in the mixed solution; among them, HF and HNO 3 The ratio of the mixed solution is HF:HNO 3 =1:7, corrosion temperature: 15°C, corrosion time: 4 minutes;

[0060] Step 2: Soak the once-etched silicon wafer in NaOH solution; the concentration of NaOH solution is 0.1%, and the soaking time is 50 seconds;

[0061] Step 3: Rinse the silicon wafer soaked in step 2 with deionized water;

[0062] Step 4: Place the wafer in HF-rich HF and HNO 3 The secondary corrosion is carried out in the mixed solution; among them, HF and HNO 3 The ratio of the mixed solution is HF:HNO 3 =30:1, corrosion temperature: 25°C, corrosion time: 5 minutes.

[0063] Step 5: Soak the silicon wafer after secondary etching in NaOH solution to remove porous silicon; wherein the concentration of NaOH solution is 0.1%...

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Abstract

An etching technology of twice etching on surface of a solar battery comprises the following steps: step 1, placing a silicon chip in an HF and HNO3 mixed solution richly containing HNO3 to conduct first etching; step 2, placing the silicon chip subjected to the first etching into NaOH solution to soak; step 3, washing the silicon chip subjected to soaking in the step 2 with deionized water; step 4, placing the silicon chip in mixed solution of HF of rich HF and HNO3 to conduct second etching; step 5, placing the silicon chip subjected to the second etching in NaOH solution to soak to remove porous silicon; step 6, washing the silicon chip subjected to soaking in the step 5 with mass deionized water, and drying; step 7, placing the silicon chip in mixed solution of HF and HCL to soak to remove oxidizing layer and metal ions; step 8, drying the silicon chip after being cleanly washed by the deionized water. According to the method, the silicon chip is subjected to the first etching in a rich HNO3 system, and then is subjected to the second etching in a rich HF system; therefore, not only the cost can be saved, but also the etching is uniform and stable.

Description

technical field [0001] The invention relates to a treatment process for the surface of a solar cell, in particular to a secondary corrosion texturing process for the surface of a solar cell. Background technique [0002] In the treatment of the surface of solar cells, texturing is the process of pre-cleaning the silicon surface and corroding it into a pyramid-like or honeycomb-like structure with strong alkali or strong acid. The function of texturing is to remove the damaged layer and form an anti-reflection texture (light-trapping structure). The purpose of texturing is to use the principle of light trapping to increase light absorption, increase short-circuit current, and increase the area of ​​the PN junction. For this reason, people have tried many new wool-making processes, and these methods all can obtain better suede effect, but there are various deficiencies. Mechanical grooving is not suitable for thin-substrate solar cells due to its large groove depth and high r...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18
CPCY02P70/50
Inventor 汪昭辉郭文林庞益静张盛杰杨健张旭
Owner JIANGSU ST SOLAR
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