Control method of oxygen content in single crystal furnace
A control method and technology of a single crystal furnace, applied in the directions of single crystal growth, chemical instruments and methods, crystal growth, etc., can solve the problems of low conversion efficiency of silicon cells, and achieve the effect of reducing oxygen content and ensuring conversion efficiency.
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[0006] The invention will be further described below in conjunction with specific embodiments. It includes the following steps:
[0007] 1. Vacuum the single crystal furnace;
[0008] 2. Start heating up at a power of 30 kW / h, increase the power of 10 kW / h every 10 minutes, and keep the pressure of argon in the single crystal furnace within the range of 55-65 mTorr until the power reaches 60 kW / h Hour;
[0009] 3. After maintaining the power of 60 kW / h for half an hour, increase the power to 75 kW / h to raise the temperature, and keep the pressure of argon in the single crystal furnace within the range of 55-65 mTorr;
[0010] 4. After maintaining the power of 75 kW / h for half an hour, increase the power to 80-90 kW / h to raise the temperature, and keep the pressure of argon in the single crystal furnace within the range of 55-65 mTorr;
[0011] 5: Keep the power at 80-90 kW / h until the silicon material is melted, and keep the pressure of argon in the single crystal furnace w...
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