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Filament exchange jig and filament exchange structure

A replacer and filament technology, applied in the direction of discharge lamps, gas discharge lamp parts, discharge tubes, etc., can solve the problems of heavy weight, increase the burden on replacement operators, etc., and achieve the effect of reducing the burden

Active Publication Date: 2013-12-04
NISSIN ION EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] In order to prevent the auxiliary vacuum container 1A from being crushed by the atmospheric pressure when the inside is evacuated, the auxiliary vacuum container 1A is formed of a metal body and thus heavy, so the installation and removal operations of the auxiliary vacuum container 1A are repeated many times. , will increase the burden on the replacement operator

Method used

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  • Filament exchange jig and filament exchange structure
  • Filament exchange jig and filament exchange structure
  • Filament exchange jig and filament exchange structure

Examples

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Effect test

Embodiment Construction

[0060] A filament changer 100 and a filament replacement structure 200 according to one embodiment of the present invention will be described with reference to the drawings.

[0061] The filament replacer 100 of this embodiment is used to replace the filament 61 of an ion source 300 that generates an ion beam for implanting ions into a liquid crystal glass substrate or a semiconductor substrate, for example, in manufacturing a liquid crystal display or a semiconductor device. In addition, the filament changer 100 can also be used to replace the filament 61 of the electron source that generates electron beams. Next, replacement of the filament 61 arranged in the plasma generation chamber of the vacuum chamber C serving as the ion source 300 will be described as an example.

[0062] For example figure 1 As shown, the ion source 300 is a multi-filament ion source in which a plurality of filaments 61 are arranged in the vertical direction. More specifically, the flanged current...

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PUM

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Abstract

The invention provides a filament exchange jig and a filament exchange structure, which does not always occupy redundant space for exchanging a filament, and can reduce loading / unloading times of an auxiliary vacuum container when the filament exchange. The filament exchange jig comprises the auxiliary vacuum container and an operation rod, wherein the operation rod goes through the auxiliary vacuum container, and a front end part of the operation rod is installed on a filament support structure in the auxiliary vacuum container, for withdrawing the filament from a vacuum chamber to the auxiliary vacuum container when the auxiliary vacuum container is in a vacuum air discharging state. The auxiliary vacuum container comprises: a container main body, forming an installing port which is contacted with the exterior of the vacuum chamber, can demountably installed on the exterior of the vacuum chamber, and make the filament pass through, wherein the filament can be taken out by the operation rod, and a filament getting-out port for the filament passing through when exchanging the filament; and a cover, capable of opening or closing the filament getting-out port.

Description

technical field [0001] The present invention relates to a filament changer and a filament replacement structure used when replacing a filament used in a vacuum chamber such as an ion source or an electron source. Background technique [0002] For example, in the manufacture of liquid crystal displays and semiconductor devices, ion implanters are used to implant ions into liquid crystal glass substrates and semiconductor substrates. An ion source for generating plasma and extracting ion beams is provided in the ion implantation apparatus. [0003] In the ion source, a plurality of filaments protrude from a plasma generation chamber that communicates with a processing chamber that irradiates an ion beam to a substrate and maintains a vacuum, and the gas introduced into the plasma generation chamber ionized to produce plasma. [0004] However, the filament may be deteriorated or damaged as the ion source is operated over time, so that the filament needs to be replaced periodi...

Claims

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Application Information

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IPC IPC(8): H01J37/02H01J37/08
CPCH01J5/14H01J37/08H01J61/34H01J2237/186
Inventor 滝上佳宏中矢良田村茂久
Owner NISSIN ION EQUIP CO LTD
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