Infrared cut-off filter and lens module

An infrared cut-off and filter technology, applied in the field of optical components, can solve the problems of deteriorating the imaging quality of the imaging system, and achieve the effect of preventing the imaging quality and improving the reflectivity.

Inactive Publication Date: 2013-12-18
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
View PDF15 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, sapphire has a high transmittance to infrared light, and if the infrared l

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Infrared cut-off filter and lens module
  • Infrared cut-off filter and lens module
  • Infrared cut-off filter and lens module

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0013] like figure 1 As shown, an infrared cut filter 100 provided in the first embodiment of the present invention includes a substrate 10 and an infrared cut film 20 plated on the substrate 10 . The infrared cut-off filter 100 is used to filter out the infrared light in the light.

[0014] The substrate 10 is flat and made of sapphire material. The sapphire belongs to the corundum minerals, has a trigonal crystal system, and has a hexagonal structure. The main chemical composition of the sapphire is aluminum oxide (Al 2 o 3 ), its refractive index is 1.760-1.757, and the crystallographic direction of the sapphire is the a axis (11 0), c-axis (0001), m-axis (10 0). The transmittance of the sapphire to infrared light with a wavelength of 825-1300nm is greater than 85%. The substrate 10 includes an upper surface 11 and a lower surface 12 opposite to the upper surface 11 .

[0015] The infrared cut-off film 20 is deposited on the upper surface 11 of the substrate 10 by...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides an infrared cut-off filter which comprises a substrate and an infrared cut-off film. The infrared cut-off film is plated on the substrate. The substrate is made of sapphire. The infrared cut-off film is used for filtering infrared light rays in light rays, a film system structure of the infrared cut-off film is (xHyL)<eta>, the eta is larger than or equal to 30 and is smaller than or equal to 80, the x is larger than 1 and is smaller than 2, the y is larger than 1 and is smaller than 2, the eta is a positive integer, the H represents layers with high refractive indexes and the thicknesses equal to 1/4 of the central wavelength, the L represents layers with low refractive indexes and the thicknesses equal to 1/4 of the central wavelength, xH represents layers with high refractive indexes and the thicknesses equal to x/4 of the central wavelength, yL represents layers with high refractive indexes and the thicknesses equal to y/4 of the central wavelength, and the eta is the number of stacked cycles of the layers with the high refractive indexes and the layers with the low refractive indexes. The infrared cut-off filter has the advantage that the infrared cut-off film is plated on the substrate made of the sapphire, so that an infrared filtering effect of the sapphire substrate can be effectively improved. The invention further provides a lens module comprising the infrared cut-off filter.

Description

technical field [0001] The invention relates to an optical element, in particular to an infrared cut-off filter and a lens module using the infrared cut-off filter. Background technique [0002] Sapphire is widely used in imaging systems due to its high hardness and high wear resistance. However, sapphire has high transmittance to infrared light, and if the infrared light cannot be filtered, the imaging quality of the imaging system will be degraded. Contents of the invention [0003] In view of this, it is necessary to provide an infrared cut-off filter using sapphire as a substrate and a lens module using the infrared cut-off filter that can improve the imaging quality. [0004] An infrared cut-off filter, which includes a substrate and an infrared cut-off film. The substrate includes an upper surface and a lower surface opposite to the upper surface, and the infrared cut-off film is plated on the upper surface. The substrate is made of sapphire. The infrared cut-off...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B5/26G02B7/02G02B1/11B32B9/04B32B33/00
Inventor 陈杰良王仲培魏朝沧
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products