Large-area microwave plasma chemical vapor deposition system

Abstract

The invention belongs to the microwave plasma chemical vapor deposition system field, and mainly relates to a microwave plasma chemical vapor deposition system for preparation of a large-area high-quality diamond film. The system mainly includes a vacuum part and a microwave lead-in part, the vacuum part includes a vacuum chamber and a vacuum chamber upper cover, two concave parts with different specific sizes are formed on the center-side surface of the vacuum chamber upper cover, so that the vacuum chamber is a multi-mode chamber body, two large-area even-energy plasma spheres produced by two modes are formed above a substrate table, the microwave lead-in part mainly includes, from bottom to top, a waveguide, a quartz ring and a mode transforming antenna, the substrate table combines the lower part of the chamber body so as to clamp the quartz ring to maintain the vacuum, the mode transforming antenna leads microwave into the vacuum chamber, and the vacuum chamber, the mode transforming antenna and the water-cooled substrate table are fixed by a ceramic ring to maintain strict centring.

Description

technical field [0001] The invention belongs to the field of microwave plasma chemical vapor deposition systems, and mainly relates to a microwave plasma chemical vapor deposition system for preparing high-quality large-area diamond films. Background technique [0002] Diamond film has the characteristics of wide bandgap, high thermal conductivity, high hardness and high infrared transmittance, and has excellent application prospects in high-power semiconductors, heat sinks, infrared detection windows and other fields. In these applications, the requirements for the prepared diamond film mainly focus on high purity, high uniformity and large area, among which the large-area deposition of diamond film can greatly reduce the cost and further promote the industrial application of diamond film. Microwave plasma chemical vapor deposition has the advantages of electrodeless discharge, concentrated and evenly distributed energy in the discharge area, etc., and can achieve rapid dep...

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Problems solved by technology

After decades of development and improvement, the best antenna-coupled stainless steel resonant cavity MPCVD device in China (operating frequency is 2.45 GHz), the microwave power level that can be coupled into the vacuum cavity is close to the limit, making the high power and high It is quite difficult to deposit large-area films under atmospheric pressure

At the same time, because the quartz window is located directly above the plasma ball, when the air pressure is low and the power is high, the plasma ball will be stabilized at the quartz window, thereby causing damage to the quartz window. power operation will be particularly difficult

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