Preparation method of nano-scale silicon dioxide

A silica and nano-scale technology, applied in the chemical industry, can solve the problems of expensive raw materials, less surface hydroxyl groups, and small dispersed particle size, and achieve the effects of low cost, wide sources, and convenient material acquisition

Active Publication Date: 2014-03-12
贵州天合国润高新材料科技有限公司
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AI Technical Summary

Benefits of technology

In this new process described by our company, we use different materials like silicone rubber (SiO2) instead of traditional methods such as quartz sand) to make nanoparticles called silicate particles. These small SiCparents can be collected from various sources without being expensive due to their large surface area compared to other types of particulate matter. They are also more stable than pure silane when exposed at higher temperatures during manufacturing processes.

Problems solved by technology

This patented technical problem addressed by this patents relates to finding ways to make stable, strong, thin films made from pure crystalline particles with minimal defects on their surfaces without requiring excessive material costs during production processes.

Method used

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  • Preparation method of nano-scale silicon dioxide

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preparation example Construction

[0024] The embodiment of the present invention provides a preparation method of nano-scale silicon dioxide, comprising:

[0025] After mixing the silicon-containing substance and the fluoride, the fluorination reaction is carried out to obtain gas-phase silicon tetrafluoride;

[0026] High-temperature hydrolysis of the silicon tetrafluoride to obtain nano-scale silicon dioxide;

[0027] performing quenching crystallization on the silicon dioxide to obtain the granular silicon dioxide;

[0028] Wherein, the silicon-containing material includes any one or more of the following: minerals containing silicon metal oxides or waste materials containing silicon dioxide.

[0029] The reactant that adopts in the present invention is the silicon-containing substance of the mineral of silicon-containing metal oxide or the waste material containing silicon dioxide, and this raw material abounds in everywhere, and source is wide, and material is convenient, and cost is lower, and because s...

Embodiment 1

[0068] Embodiment 1: with coarse particle SiO 2 and NH 4 F as raw material to prepare nanoscale SiO 2 powder

[0069] Coarse SiO 2 and NH 4 F mixed evenly, coarse particle SiO 2 with NH 4 The particle size of F is less than 3mm, and the NH in the resulting mixture 4 The mass percentage of F is 10%. Calcinate the mixture at a temperature of 600-800°C for 5 hours to generate NH 3 、H 2 O and SiF 4 , SiF 4 escaped from the solid. SiF that will escape 4 Introduce into another reactor, and feed water vapor, the volume ratio of silicon tetrafluoride and water vapor is 1:10, after hydrolysis at 810-1000°C, dry and dehydrate with concentrated sulfuric acid to remove NH 3 , generating SiO 2 and HF gas. Quenching of high temperature mixed gas to obtain SiO 2 Granules, the cooling rate is 100°C / min. Particles undergo post-treatment processes such as aggregation, separation, and deacidification to obtain SiO 2 Powder, particle size: about 50-80 nanometers. The reaction e...

Embodiment 2

[0072] Embodiment 2: with bauxite and AlF 3 Preparation of fine particle size SiO as raw material 2 powder

[0073] Bauxite ((Al 2 o 3 ) m (TiO 2 ) n SiO 2 ) with AlF 3 Mix well, bauxite and AlF 3 The particle size is below 5mm, and the AlF in the resulting mixture 3 The mass percentage is 40%. Calcinate the mixture at a temperature of 1100-1300°C for 4 hours to generate Al 2 o 3 and SiF 4 , SiF 4 escaped from the solid. SiF that will escape 4 Introduce into another reactor and feed water vapor, the volume ratio of silicon tetrafluoride and water vapor is 1:40, and SiO will be generated after hydrolysis at 1000-1200 °C 2 and HF gas. Quenching of high temperature mixed gas to obtain SiO 2 For pellets, the cooling rate is 50-200°C / min. Particles undergo post-treatment processes such as aggregation, separation, and deacidification to obtain SiO 2 Powder, particle size: about 5-47 nanometers. The reaction equation is as follows:

[0074] 3SiO 2 +4AlF 3 ·3H ...

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Abstract

The invention relates to the field of chemical industry and specifically relates to a preparation method of nano-scale silicon dioxide. The preparation method comprises the following steps: mixing a silicon-containing substance and a fluoride, and then performing fluorination reaction to obtain gas-phase silicon tetrafluoride; performing high-temperature hydrolysis on the silicon tetrafluoride to obtain the nano-scale silicon dioxide; and performing quenching crystallization on the silicon dioxide to obtain particulate silicon dioxide, wherein the silicon-containing substance comprises mineral containing a silicon metal oxide or waste material containing the silicon dioxide. A reactant adopted in the preparation method provided by the invention is the silicon-containing substance, namely the mineral containing the silicon metal oxide or the waste material containing the silicon dioxide, and the raw material can be bound everywhere and further has the advantages of wide sources, convenience in taking the material and relatively low cost; and furthermore, as silicon is a fluorophilic substance, the silicon is in contact with fluorine to react firstly to generate the gas-phase silicon tetrafluoride, the high-temperature hydrolysis is performed on the silicon tetrafluoride to perform intermolecular reaction to obtain the nano-scale silicon dioxide, and then the quenching crystallization is performed to agglomerate to form the particulate silicon dioxide for collection.

Description

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Claims

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Application Information

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Owner 贵州天合国润高新材料科技有限公司
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