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Ion source devices and methods

An ion source and ionization technology, applied in ion beam tubes, ion implantation plating, semiconductor/solid-state device manufacturing, etc., can solve problems such as limited life of ion sources

Active Publication Date: 2016-11-23
INFINEON TECH AG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Traditional ion sources tend to have a limited lifetime

Method used

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  • Ion source devices and methods
  • Ion source devices and methods
  • Ion source devices and methods

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Embodiment Construction

[0016] Reference will now be made to the drawings, wherein like structures will be provided with like reference numerals. It is to be understood that the drawings are diagrammatic and schematic representations of exemplary embodiments of the invention and are not limiting of the invention nor necessarily drawn to scale.

[0017] Figure 1A shows an ion source and Figure 1B show Figure 1A Detailed view of the cathode. Particularly, Figure 1A Ion source 1 comprising chamber 3 , cathode 15 , and repeller electrode 19 is shown. The chamber 3 has four side walls 5 , 7 , 9 , 11 and a bottom 13 , wherein a repeller electrode 19 is arranged along the side walls 5 , while a cathode 15 and a cathode nut 17 are oppositely arranged along the side walls 7 . In operation, cathode 15 provides a flow of electrons within chamber 3 . Cathode 15 and repeller electrode 19 are generally composed of tungsten (W) or an alloy thereof. In this example, the bottom 13 , and the side walls 5 , 7 ,...

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Abstract

Ion source devices and methods. The ion source includes a chamber defining an interior cavity for ionization, an electron beam source at a first end of the interior cavity, an inlet for introducing an ionizable gas into the chamber, and a Arc-shaped slits that extract ions. The chamber includes conductive ceramic.

Description

technical field [0001] The present disclosure relates to devices and methods for electrically manipulating particles, and more particularly to devices and methods for generating ions. Background technique [0002] An ion source is a device used to generate charged particles, or ions. Ions have a variety of applications in both science and industry. Ion sources can be used, for example, in conjunction with various spectrometers, particle accelerators, or ion implanters. Semiconductor doping, especially the important application of ion sources, doped semiconductors form the basis of modern electronics. [0003] Traditional ion sources tend to have a limited lifetime. The effective lifetime of a conventional ion source can be about 40 hours based on the plasma used. Contents of the invention [0004] In a first implementation, the ion source comprises a chamber defining an inner cavity for ionization, an electron beam source at a first end of the inner cavity for introduc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/08C23C14/48
CPCH01J37/08H01J27/08H01J37/317H01J37/3171H01L21/265
Inventor F.格宾
Owner INFINEON TECH AG