Thin film thermistor and resistance adjusting method thereof

Abstract

The invention discloses a thin film thermistor and a resistance adjusting method thereof. The thin film thermistor comprises an insulating substrate, a pair of electrode couples arranged on the insulating substrate, and metal patterns which extend out of at least one of the pair of electrode couples and are used for adjusting the resistance. With the design of the electrode couples in a special structure, a fine adjustment cutting part for finely adjusting the resistance and a rough adjustment cutting part used for roughly adjusting the resistance are simultaneously designed on the metal patterns used for adjusting the resistance, and the rough adjustment cutting part is respectively inserted into a convex structure of a first electrode in the electrode couples, so that an effect of adjusting the resistance in a wider range can be achieved after the rough adjustment cutting part is cut, and the fine adjustment cutting part can have an effect of finely adjusting the resistance. Therefore, the thin film thermistor can simultaneously realize functions of fine adjustment and rough adjustment of the resistance.

Description

technical field [0001] The invention relates to a thin film thermistor and a method for adjusting its resistance value, belonging to the technical field of electronic ceramic materials. Background technique [0002] Due to the functions of temperature compensation and overcurrent protection, film thermistors are widely used in complex integrated circuits. Screen printing and magnetron sputtering are usually used to prepare thermistors. Since the thickness of the thermosensitive film cannot be accurately controlled during the preparation process, the precision of the resistance of the film thermistor cannot be controlled. The resistance value of the film resistor prepared in this way cannot meet the precision requirement, and the precision adjustment of the resistance value is still required. [0003] At present, laser irradiation is often used in industry to cut the heat-sensitive film to achieve the purpose of controlling the precision of resistance value. However, this m...

AI Technical Summary

Problems solved by technology

However, this method has the following disadvantages: First, the thermal film resistor has a large temperature coefficient of resistance, the heat generated by laser irradiation will be transferred to the thermal film, and the electrical characteristics of the resistor will change during cutting, so it cannot be accurately Adjust the resistance; second, laser irradiation will cause the resistance film to heat and evaporate, and the electrical properties will change partially; third, the thermal conductivity of the film-like resistive insulating substrate is generally high, and the output power of the laser must be increased. The heat will cause the aging of the resistor performance

Although this method can accurately adjust the resistance value of the thin film thermistor, it is limited to the fine adjustment of the resistance value; it is also mentioned in the above-mentioned patent document that when coarsely adjusting the resistance value of the thin film thermistor, it needs to pass two or multiple coating methods to solve

And multiple coatings will not only increase the production cost, but also when the resistance value of the sample is much lower than the target resistance value, that is, outside the resistance fine-tuning range, the sample can only be discarded.

Images