High-grade facial cleanser formula

A facial cleanser and formulation technology, which is applied in pharmaceutical formulations, cosmetic preparations, dressing preparations, etc., and can solve problems such as low neutralization capacity and poor buffer neutralization capacity

Inactive Publication Date: 2014-07-02
NANJING HENGQING BUILDING EQUIP CO LTD QINGDAO BRANCH
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The skin has a higher neutralization ability to cold creams and cream creams, on the contrary, the skin ha...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0008] The facial cleanser formula of the present invention includes ginseng, antler, banana, green tea, sodium cocoyl isethionate, sodium acyl sarcosinate, alkyl polyglucoside, sodium acyl sulfonate, polyoxyethylene lauryl ether succinic acid Sodium Monoester Sulfonate, Deionized Water. Among them, 10 parts of sodium cocoyl isethionate, 10 parts of sodium acyl sarcosinate, 20 parts of alkyl polyglucoside, 20 parts of sodium acyl sulfonate, 20 parts of sodium lauryl alcohol polyoxyethylene ether succinate Sodium sulfonate is 10 parts. In addition, 0.1 part of ginseng, 0.05 part of deer antler, 2 parts of banana extract, 0.05 part of green tea extract, and the balance is water.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a facial cleanser formula which comprises ginseng, hartshorn, banana, green tea, sodium cocoyl isethionate, sodium cocoyl sarcosinate, alkyl polyglycoside, sodium cocoyl isethionate, polyethylene glycol lauryl ether succinate and deionized water. The facial cleanser comprises 10 parts of sodium cocoyl isethionate, 10 parts of sodium cocoyl sarcosinate, 5-20 parts of alkyl polyglycoside, 5-20 parts of sodium cocoyl isethionate, 10 parts of polyethylene glycol lauryl ether succinate and 2 parts of banana extract.

Description

technical field [0001] The invention relates to a formula of high-grade facial cleanser, in particular to a formula of facial cleanser containing ginseng antler. Background technique [0002] Whether the skin is good or bad depends mainly on whether the skin is healthy, and whether it is healthy is reflected in the alkali neutralization ability of the skin. The pH value of the skin of different people often changes between 4.5-6.5 in different periods, and some are beyond this range. If the pH value of the skin is outside 5.0-5.6 for a long time, the alkali neutralization ability of the skin will be weakened, and the skin texture will be weakened. will change, eventually leading to aging and damage to the skin. Therefore, only by choosing corresponding skin care products to keep the pH value of the skin between pH 5.0-5.6, will the skin be in the best condition and truly achieve a more beautiful and healthier effect. Any skin care method, whether it is genetic beauty or na...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K8/98A61K8/97A61Q19/10
Inventor 赵文萍
Owner NANJING HENGQING BUILDING EQUIP CO LTD QINGDAO BRANCH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products