A device and method for automatic detection of process corners

Abstract

The invention proposes a process-corner automatic detection device and method. The process-corner automatic detection device includes a phase discriminator, a voltage-controlled oscillator, a loop frequency divider and an automatic judgment and correction module. Frequency signals input at an input end of the phase discriminator include process corner information. The automatic judgment and correction module outputs different control words to the voltage-controlled oscillator according to the size of a control voltage output by the phase discriminator; the voltage-controlled oscillator outputs frequency bands under the control of the control words and the output frequency bands are in one-to-one correspondence to the sizes of the control words. The loop frequency divider feeds back frequency-band information output by the voltage-controlled oscillator to the phase discriminator and adjusts the size of the control voltage output by the phase discriminator. When the size of the control voltage output by the phase discriminator meets a threshold demand, the sizes of the control words are related with the sizes of processor corners. The process-corner automatic detection device and method perform automatic correction on a multiband phase-locked loop through the control words output by the automatic judgment and correction module so that process-corner automatic detection is realized and a demand that a high-precision analog circuit should correct process-corner deviations is met.

Description

technical field [0001] The invention relates to the technical field of circuit design, in particular to a detection device and method capable of automatically detecting the size of a process angle. Background technique [0002] The process angle reflects the change of some process parameters in the chip production process, such as gate oxide thickness, doping concentration, etc. The current variation range of the performance parameters of the chip is usually given in the form of the process angle. If the 3-corner model is adopted, there will be TT, FF and SS3 corners. TT refers to NFET-Typical corner and PFET-Typical corner (typical process corner of N-type field effect transistor and typical process corner of p-type field effect transistor), FF refers to NFET-Fast corner and PFET-Fast corner (N-type field effect transistor The fast process corner and the fast process corner of the p-type field effect transistor), SS refers to the NFET-Slowcorner and PFET-Slow corner (the s...

AI Technical Summary

Problems solved by technology

[0004] The existing process corner detection method is to use the delay of the standard cell to judge the size of the process corner. The delay of the standard cell is determined by the power supply voltage, temperature and process corner. If two of the variables, such as the power supply voltage and temperature, are fixed, the process corner is determined by this The delay time is determined. Although this method can detect the size of the process corner, this solution requires two power supplies and the circuit is complicated.

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