A kind of superhydrophobic superoleophobic anti-reflection glass surface layer and preparation method thereof
A super-hydrophobic, super-oleophobic, glass surface technology, which is applied in the fields of self-cleaning optical materials, new materials, and surface treatment, can solve problems such as unstable performance, insufficient durability, and poor mechanical properties, and achieve high light transmittance and Hydrophobic and oleophobic, enhanced coating ability, and improved mechanical strength
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Embodiment 1
[0022] This example is the preparation of superhydrophobic superoleophobic anti-reflection glass surface layer. The specific process is as follows: the glass substrate is ultrasonicated in deionized water and absolute ethanol for 20 minutes respectively to clean the glass substrate; 3 :O 2 The volume ratio is 4:1, the gas mixture pressure is 80Pa, and the power is 1.8W / cm 2 Under the conditions of the clean glass surface, the plasma etching was carried out to obtain a submicron rough glass surface; 4 mL tetraethyl orthosilicate was added dropwise to a mixed solvent composed of 15 mL absolute ethanol and 8 mL water, and 20 wt % Pluronic F108 ( BASF company) ethanol solution 4mL, stirred for 0.5h to obtain a mixed solution, dropwise added 1mL of concentrated hydrochloric acid (36wt%) to the above mixed solution; stirred at room temperature for 2h to obtain SiO 2 Sol dipping solution; the submicron rough glass surface is immersed in SiO at a speed of 50mm / min 2 Stay in the sol...
Embodiment 2
[0024] This example is the preparation of superhydrophobic superoleophobic anti-reflection glass surface layer. The specific process is as follows: the glass substrate is ultrasonicated in deionized water and absolute ethanol for 20 minutes respectively to clean the glass substrate; 3 :O 2 The volume ratio is 4:1, the gas mixture pressure is 90Pa, and the power is 1.9W / cm 2 Under the condition of the clean glass surface, the plasma etching was carried out to obtain a submicron rough glass surface; 4mL tetraethyl orthosilicate was added dropwise to a mixed solvent composed of 20mL absolute ethanol and 9mL water, and 20wt% PluronicF127 ( BASF company) ethanol solution 6mL, stirred for 0.5h to obtain a mixed solution, dropwise added 1mL of concentrated hydrochloric acid (36wt%) to the above mixed solution; stirred at room temperature for 2.5h to obtain SiO 2 Sol dipping solution; the submicron rough glass surface is immersed in SiO at a speed of 50mm / min 2 Stay in the sol dipp...
Embodiment 3
[0026] This example is the preparation of superhydrophobic superoleophobic anti-reflection glass surface layer. The specific process is as follows: the glass substrate is ultrasonicated in deionized water and absolute ethanol for 20 minutes respectively to clean the glass substrate; 3 :O 2 The volume ratio is 4:1, the gas mixture pressure is 100Pa, and the power is 2.0W / cm 2 Under the conditions of the clean glass surface, the plasma etching was carried out to obtain a submicron rough glass surface; 4mL tetraethyl orthosilicate was added dropwise to a mixed solvent composed of 23mL absolute ethanol and 10mL water, and 20wt% PluronicP123 ( BASF company) ethanol solution 8mL, stirred for 0.5h to obtain a mixed solution, dropwise added 1mL of concentrated hydrochloric acid (36wt%) to the above mixed solution; stirred at room temperature for 3h to obtain SiO 2 Sol dipping solution; the submicron rough glass surface is immersed in SiO at a speed of 50mm / min 2 Stay in the sol dip...
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