Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Combined mask

A combined, masking technology, applied in the field of masking, can solve the problems of difficulty in manufacturing, waste of materials, and high cost, and achieve the effect of avoiding distortion of the coating pattern

Active Publication Date: 2014-08-20
FINEMAT APPLIED MATERIALS
View PDF3 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a combined mask in order to solve the problems of waste material, difficult manufacture and high cost in the manufacture of the existing one-piece mask

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Combined mask
  • Combined mask
  • Combined mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0047] In order to have a more complete and clear disclosure of the invention purpose, technical means and technical effects of the present invention, a detailed description is given below, and please also refer to the accompanying drawings and component numbers.

[0048] like figure 1 As shown, it discloses the first preferred embodiment of the combined cover of the present invention. The combined cover 1 includes four main frame plates 10, and the four main frame plates 10 are overlapped vertically and horizontally and enclose Form a rectangular frame with a main rectangular coating area 103 inside, and make one side of the assembled main frame plates 10 form a flat contact surface with the object to be plated.

[0049] Described main frame plate 10 is to select the material of low coefficient of expansion to make for good, as the nickel-iron alloy (Invar 36) that contains nickel 36%, the nickel-iron alloy (Invar 42) that contains nickel 42% etc.; Make these main frame plate...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a combined mask. The combined mask comprises four main frame plates that are vertically and horizontally overlapped to form a rectangular frame internally provided with a main rectangular coating area, and ones sides of the main frame plates can form a flush coated object contact surface. Thereby, the mask with a large-area coating area can be formed. In addition, and the characteristics of easy manufacturing and no material waste of the strip-shaped main frame plates are utilized to reach the efficacy of saving manufacturing materials and reducing the cost. Also, the coated object contact surface of the combined mask is flush, can be attached to the coated object surface as far as possible. In a coating deposition process, the coating material for evaporation or sputtering can be effectively prevented from passing through the gap between the combined mask and the coated object, thus avoiding the circumstance of coating pattern distortion.

Description

technical field [0001] The present invention relates to a mask, in particular to a combined mask applied in the field of film deposition such as sputtering or vapor deposition. Background technique [0002] In the coating deposition process, in order to accurately deposit the deposition material on the predetermined position of the substrate to form a specific shape of the coating, a mask is installed between the deposition material source and the substrate, so that the deposition material source can be deposited through thermal evaporation or When the atoms or molecules in the deposition material are dissociated due to the impact of high-energy ions, a part of the atoms or molecules in the dissociated deposition material passes through the coating location holes in the mask by using the coating location holes set on the mask to deposit A coating film of a specific shape is formed at a predetermined position on the surface of the substrate, and the remaining atoms or molecul...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/04
Inventor 李训杰李仲仁郦唯诚赵勤孝
Owner FINEMAT APPLIED MATERIALS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products