Full-permeable bismuth-based pyrochlore thin film voltage-controlled varactor and manufacturing method thereof
A technology of pyrochlore and varactor, applied in the field of fully transparent bismuth-based pyrochlore thin-film voltage-controlled varactor and its preparation, achieving the effects of high transparency, good device stability, and moderate tuning rate
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Embodiment 1
[0034] (1) Preparation of Bi by solid-state sintering method 1.5 Mg 1.0 Nb 1.5 o 7 target
[0035] Press Bi with electronic balance 1.5 Mg 1.0 Nb 1.5 o 7 The stoichiometric ratio of the corresponding elements weighs Bi with a purity of 99%. 2 o 3 , MgO and Nb 2 o 5 , after being fully mixed, pressed and formed under a pressure of 30Mpa, and finally placed in a box-type electric furnace and gradually heated to 1150°C, and kept for 10 hours.
[0036] (2) The AZO conductive glass substrate with AZO, that is, the Al-doped ZnO film as the bottom electrode layer, is ultrasonically cleaned with acetone, ethanol and deionized water, and cleaned with N 2 Blow dry and place on magnetron sputtering sample stage.
[0037](3) Pump the background vacuum of the magnetron sputtering system to 6.0×10 -6 Torr, then heat the AZO conductive glass substrate to 500 °C.
[0038] (4) with high purity (99.99%) Ar and O 2 As the sputtering gas, the flow ratio of argon and oxygen was 17:3...
Embodiment 2
[0045] (1) Preparation of Bi by solid-state sintering method 1.5 Zn 1.0 Nb 1.5 o 7 target
[0046] Press Bi with electronic balance 1.5 Zn 1.0 Nb 1.5 o 7 The stoichiometric ratio of the corresponding elements weighs Bi with a purity of 99%. 2 o 3 , ZnO and Nb 2 o 5 , after being fully mixed, pressed and formed under a pressure of 30Mpa, and finally placed in a box-type electric furnace and gradually heated to 1050°C, and kept for 10 hours.
[0047] (2) The AZO conductive glass substrate with AZO, that is, the Al-doped ZnO film as the bottom electrode layer, is ultrasonically cleaned with acetone, ethanol and deionized water, and cleaned with N 2 Blow dry and place on magnetron sputtering sample stage.
[0048] (3) Pump the background vacuum of the magnetron sputtering system to 7.0×10 -6 Torr, then heat the AZO conductive glass substrate to 500 °C.
[0049] (4) with high purity (99.99%) Ar and O 2 As the sputtering gas, the flow ratio of argon and oxygen was 17:...
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