Growth method and application of minor-diameter metallic single-walled carbon nanotube

A technology of single-walled carbon nanotubes and growth methods, which is applied in the field of direct and controllable preparation of metallic single-walled carbon nanotubes, can solve problems such as complex process and carbon nanotube structure damage, and achieve the effect of mass doping

Active Publication Date: 2014-08-27
INST OF METAL RESEARCH - CHINESE ACAD OF SCI
View PDF6 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a method for directly growing small-diameter, metallic single-walled carbon nanotubes by using nitrogen to regulate the active sites on the surface of non-metallic catalysts and its application, realizing the direct growth control of metallic single-walled carbon nanotubes , and the obtained sample does not contain metal pollutants, breaking through the bottleneck of direct preparation of metallic single-walled carbon nanotubes, and overcoming the shortcomings of the existing post-processing separation methods to obtain metallic carbon nanotubes, that is, the intrinsic structure of carbon nanotubes Serious damage, complicated process, etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Growth method and application of minor-diameter metallic single-walled carbon nanotube
  • Growth method and application of minor-diameter metallic single-walled carbon nanotube
  • Growth method and application of minor-diameter metallic single-walled carbon nanotube

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] After raising the temperature of the chemical vapor deposition furnace to 900°C, place the p-type silicon wafer sputtered with a 30nm silicon oxide film in the low-temperature area of ​​the furnace tube of the reaction furnace, seal the tube furnace, vacuumize it to about 10Pa, and then evacuate it at 50ml / min. The flow rate of hydrogen and the flow rate of 300 ml / min of argon are fed until normal pressure is restored. Then, push the silicon wafer to a constant temperature zone of 900°C for heat treatment for 10 minutes; then change the flow rate of 200 ml / min to the argon-carried precursor (ethylenediamine, kept at a constant temperature of 30°C in a water bath) to grow for 10 minutes, and then turn off the hydrogen and the precursor Passing in, passing argon gas at a flow rate of 1200 ml / min into the chemical vapor deposition furnace for cleaning and pushing the sample to a low temperature zone. Under the protection of this atmosphere, the temperature of the reaction ...

Embodiment 2

[0041] After raising the temperature of the chemical vapor deposition furnace to 800°C, place the p-type silicon wafer sputtered with a 50nm silicon oxide film in the low-temperature area of ​​the furnace tube of the reaction furnace, seal the tube furnace, vacuumize to about 10Pa, and then pump at 100ml / min Hydrogen at a flow rate of 200 ml / min and argon at a flow rate of 200 ml / min are fed until normal pressure is restored. Then, push the silicon wafer to a constant temperature zone of 800°C for heat treatment for 20 minutes; then change the flow rate of 100 ml / min to the argon-carried precursor (acetonitrile, kept at a constant temperature of 40°C in a water bath) to grow for 20 minutes, and then turn off the hydrogen and precursors. 1200 ml / min flow of argon gas was introduced into the chemical vapor deposition furnace for cleaning and the sample was pushed to the low temperature zone. Under the protection of this atmosphere, the temperature of the reaction furnace was slo...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to view more

Abstract

The invention relates to the field of direct and controllable preparation of a metallic single-walled carbon nanotube, and in particular realtes to a growth method and application of a minor-diameter metallic single-walled carbon nanotube. A liquid nitrogen-containing organic compound is used as a carbon source and nitrogen source, hydrogen and argon are used as carrier gases, non metal silicon oxide is used as a catalyst, the single-walled carbon nanotube is grown by use of a chemical vapor phase deposition method, nitrogen acts on the catalyst in carbon nanotube nucleation and growth process, and is doped in situ into grids of the single-walled carbon nanotube, at certain temperature, single-walled carbon nanotube growth and nitrogen element doping can be simultaneously performed to obtain a minor-diameter metallic single-walled carbon nanotube network sample. The growth method realizes direct and controllable growth of the metallic single-walled carbon nanotube, the obtained minor-diameter metallic single-walled carbon nanotube network sample is free of metal contaminants, the bottleneck of direct preparing of metallic single-walled carbon nanotubes can be broken through, shortcomings of postprocessing separation methods in the prior art in obtaining of the metallic carbon nanotubes can be overcome, and the shortcomings are the problems of serious damage of the eigen structure of the carbon nanotubes and complex process.

Description

technical field [0001] The invention relates to the field of direct and controllable preparation of metallic single-walled carbon nanotubes, in particular to a growth method and application of small-diameter, metallic single-walled carbon nanotubes. Background technique [0002] Carbon nanotubes have unique and excellent electrical transport properties, and are considered to be one of the ideal materials for building next-generation nanoelectronic devices. The conductive properties of single-walled carbon nanotubes can be either metallic or semiconducting, depending on the curling of the graphene sheets that make them up. Semiconducting single-walled carbon nanotubes can be used to construct field-effect transistors and optoelectronic devices, while metallic single-walled carbon nanotubes can be used as interconnect wires between high-frequency devices or devices. The currently prepared single-walled carbon nanotubes are usually a mixture of metallic and semiconducting carb...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/26C01B31/02B82Y40/00B82Y30/00C01B32/159
Inventor 侯鹏翔李金成刘畅成会明
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products