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Device for heating substrate

A substrate and processing chamber technology, applied in the field of material crystallization devices, to achieve the effect of improving sealing

Active Publication Date: 2014-08-27
SMIT THERMAL SOLUTIONS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

A problem with known devices is to control the environment of the substrate in the processing chamber

Method used

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  • Device for heating substrate
  • Device for heating substrate
  • Device for heating substrate

Examples

Experimental program
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Embodiment Construction

[0036] In the drawings, the same parts are denoted by the same reference numerals.

[0037] figure 1 Diagrammatically illustrates a side view of a device 1 for heating a substrate according to a predetermined temperature profile for crystallizing a material on the substrate. Said device 1 is also called Rapid Thermal Processor (RTP) and is used, for example, to manufacture a certain number of photovoltaic solar cells from a substrate. The substrate may contain eg glass or borosilicate and have dimensions eg 60x40 cm, 120x60 cm or 110x140 cm. The device 1 comprises a housing 2 with layered material (eg stack of steel plates), heat resistant insulating material (eg rock wool) and graphite layers. Furthermore, the device comprises a certain number (eg three) of treatment chambers 3 , 4 , 5 which are all located in the housing 2 . The processing chambers are respectively provided with first openings 6, 8, 10 and second openings 7, 9, 11 for introducing the substrate 12 into the...

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PUM

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Abstract

A device for heating a substrate according to a predetermined temperature profile for crystallizing a material on the substrate includes: a housing, at least a process chamber situated inside the housing and provided with a first and second opening for passing through a substrate, an inlet for introducing a process gas which includes the material in vapour phase into the chamber, at least two transport rollers attached to the housing for transporting the substrate into the chamber. The device further includes passage spaces for preventing the escape of process gas from the chamber to a space between the chamber and housing, which are situated near respective ends of the transport rollers in the chamber, the respective passage spaces having a first passage opening on an inner wall of the chamber, a second passage opening on an outer wall of the chamber and a first flange fixed around the transport roller.

Description

technical field [0001] The invention relates to a device for crystallizing a material on a substrate by heating a substrate according to a predetermined temperature profile. Background technique [0002] This device is known from US 5,578,503 and is also known as a Rapid Thermal Processor (RTP). [0003] Devices are known for sequentially heating and cooling a substrate according to a specific temperature profile, eg for crystallizing material on the substrate. The previously applied selenium layer is used in particular to produce light-absorbing film layers containing copper (Cu), indium (I), gallium (Ga) and / or selenium (Se), which are used, for example, to improve the performance of solar cells. Photoelectric efficiency. Known devices are available for crystallizing such base materials, comprising eg copper, indium, gallium and / or selenium, under a controlled atmosphere of a process gas comprising eg metal vapor. [0004] Known devices may comprise a number of process ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/677H01L21/67B65G39/09F16J15/00
CPCH01L21/67109H01L31/1872H01L21/06H01L21/67706H01L21/67745H01L31/1876H01L21/67173H01L21/67017H01L21/02667H01L21/02568Y02P70/50Y02E10/50
Inventor 杰哈德·卡佩尔维罗·鲁道夫·茨尔曼斯
Owner SMIT THERMAL SOLUTIONS