Device for heating substrate
A substrate and processing chamber technology, applied in the field of material crystallization devices, to achieve the effect of improving sealing
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[0036] In the drawings, the same parts are denoted by the same reference numerals.
[0037] figure 1 Diagrammatically illustrates a side view of a device 1 for heating a substrate according to a predetermined temperature profile for crystallizing a material on the substrate. Said device 1 is also called Rapid Thermal Processor (RTP) and is used, for example, to manufacture a certain number of photovoltaic solar cells from a substrate. The substrate may contain eg glass or borosilicate and have dimensions eg 60x40 cm, 120x60 cm or 110x140 cm. The device 1 comprises a housing 2 with layered material (eg stack of steel plates), heat resistant insulating material (eg rock wool) and graphite layers. Furthermore, the device comprises a certain number (eg three) of treatment chambers 3 , 4 , 5 which are all located in the housing 2 . The processing chambers are respectively provided with first openings 6, 8, 10 and second openings 7, 9, 11 for introducing the substrate 12 into the...
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