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Electrochemical polishing apparatus and method

A polishing device and electrochemical technology, applied in the electrolysis process, electrolysis components, etc., can solve the problems of slow baseband polishing, inability to remove the baseband, and unreasonable methods.

Active Publication Date: 2017-06-30
SUZHOU NEW MATERIAL INST +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The first problem is residual particles on the base tape surface after polishing
The second problem is the columnar stripe structure that appears on the surface of the baseband
[0010] The shortcoming of above-mentioned technology is: 1. The method for solving the first problem is unreasonable
If the electrolysis process under the action of high current cannot remove particles or oil stains on the surface of the baseband, then the low-current electrolysis process set in the patent at the front end of the electropolishing will not do much
2. The method to solve the columnar stripes on the surface of the baseband is too complicated
Its disadvantage is that the polishing speed of the baseband is too slow (20 m / h), which cannot meet the needs of industrial production (requires at least 60 m / h)

Method used

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  • Electrochemical polishing apparatus and method
  • Electrochemical polishing apparatus and method

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Embodiment Construction

[0040] The technical solutions in the embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0041] ginseng figure 1 As shown, in this embodiment, the whole process can be divided into three main parts:

[0042] a. Pre-clean the workpiece to be polished before polishing;

[0043] b. Electrochemical polishing of the workpiece to be polished;

[0044] c. Clean the polished workpiece after polishing.

[0045] Pre-cleaning of the workpiece to be polished before polishing: the purpose is to remove the surface impurities of the metal substrate (the workpi...

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Abstract

The invention discloses an electrochemical polishing device, which comprises: a tank body; at least one electrolytic tank transversely arranged on the tank body, and the two ends of the tank body respectively form an inlet and an outlet for the workpiece to be polished. Move laterally in the electrolytic cell; the electrodes located on both sides of the electrolytic cell, the electric field formed by the electrodes is shielded in the electrolytic cell; the electrolyte supply pipeline is connected to the electrolytic cell and guides the electrolyte Flow along the surface of the workpiece to be polished. The invention also discloses an electrochemical polishing method. The device of the invention has a simple structure and can solve the columnar stripes appearing on the surface of the base band. The polishing method of the invention has good polishing effect and fast polishing processing speed.

Description

technical field [0001] The invention relates to an electrochemical polishing device and method. Background technique [0002] High-temperature superconducting wires represented by the second-generation ReBCO (Re=Y, or rare earth elements) are composed of various metal oxide films grown on metal substrates. The working performance of high-temperature superconducting wire depends entirely on the surface condition of the metal substrate and the growth characteristics of various metal oxide films. In order to obtain high-quality high-temperature superconducting wires, there are very high requirements on the surface of the metal substrate and the growth of various metal oxide films. [0003] First of all, it is well known that in order for ReBCO metal oxides to exhibit superconducting properties, the ReBCO film must have a metal oxide crystal structure, and this crystal structure must be biaxially oriented. In other words, the space of each crystal forming the film must be cons...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25F7/00C25F3/16
Inventor 庄维伟高永超程好杨淑平蔡渊贺昱旻
Owner SUZHOU NEW MATERIAL INST
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