Chemical polishing solution and alloy surface polishing treatment method

A technology of chemical polishing and polishing liquid, applied in the field of chemical polishing solution, to achieve the effect of easy control, pollution reduction, and smooth surface

Active Publication Date: 2014-04-30
SOUTH CHINA UNIV OF TECH
View PDF6 Cites 24 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is to provide a pollution-free and stab

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Chemical polishing solution and alloy surface polishing treatment method
  • Chemical polishing solution and alloy surface polishing treatment method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] 1. Prepare chemical polishing fluid according to the following components:

[0024] Each liter of polishing liquid contains: sodium persulfate 90g, 98% concentrated sulfuric acid 350ml, polyethylene glycol 600015g, CTAB0.5g, arginine 5g, methionine 5g, sulfosalicylic acid 2g, and the balance is water.

[0025] 2, a kind of chemical polishing method, concrete steps are as follows:

[0026] The copper alloy samples were subjected to degreasing (40g / L sodium carbonate, 35g / L sodium phosphate and 2ml / L OP-10 emulsifier, treatment for 1min), running water washing, pickling activation (10% sulfuric acid, treatment for 10s), running water Then put the sample in the chemical polishing solution prepared above and immerse it at 40°C for 8 minutes. During the chemical polishing process, the solution was properly stirred, and the sample was taken out for cleaning (washing with running water + ultrasonic cleaning with distilled water), and then blunt in turn. Chemical (6g / L benzotr...

Embodiment 2

[0028] 1. Prepare chemical polishing fluid according to the following components:

[0029] Each liter of polishing liquid contains: 40g of sodium persulfate, 450ml of 98% concentrated sulfuric acid, 600025g of polyethylene glycol, 3g of thiourea, 0.5g of cetyltrimethylammonium bromide, and the balance is water.

[0030] 2, a kind of chemical polishing method, concrete steps are as follows:

[0031] The copper alloy samples were subjected to degreasing (40g / L sodium carbonate, 35g / L sodium phosphate and 2ml / L OP-10 emulsifier, treatment for 1min), running water washing, pickling activation (10% sulfuric acid, treatment for 10s), running water Then put the sample in the chemical polishing solution prepared above and immerse it at 40°C for 6 minutes. During the chemical polishing process, the solution was properly stirred, and the sample was taken out for cleaning (washing with running water + ultrasonic cleaning with distilled water), and then blunt in turn. Chemical (6g / L benz...

Embodiment 3

[0033] 1. Prepare chemical polishing fluid according to the following components:

[0034] Each liter of polishing liquid contains: 60g of sodium persulfate, 400ml of 98% concentrated sulfuric acid, 15g / L of polyvinylpyrrolidone, CuSO 4 5g / L, sulfosalicylic acid 2g / L, arginine 5g / L, CTAB 0.5g / L, and the balance is water.

[0035] 2, a kind of chemical polishing method, concrete steps are as follows:

[0036] The copper alloy samples were subjected to degreasing (40g / L sodium carbonate, 35g / L sodium phosphate and 2ml / L OP-10 emulsifier, treatment for 1min), running water washing, pickling activation (10% sulfuric acid, treatment for 10s), running water Then put the sample in the chemical polishing solution prepared above and immerse it at 40°C for 9 minutes. During the chemical polishing process, the solution was properly stirred, and the sample was taken out for cleaning (washing with running water + ultrasonic cleaning with distilled water), and then blunt in turn. Chemical...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Roughnessaaaaaaaaaa
Roughnessaaaaaaaaaa
Roughnessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a chemical polishing solution and an alloy surface polishing treatment method. The polishing solution per liter contains 30-100g of persulfate, 300-500ml of concentrated sulfuric acid, 10-40g of viscosity modifier, 2-14g of brightener and the balance of water. The alloy surface polishing treatment method comprises the following steps: orderly performing deoiling, cleaning, acid pickling and activation and cleaning on an alloy workpiece, dipping the alloy workpiece pretreated previously in the chemical polishing solution, and after the completion of polishing, orderly cleaning, passivating, cleaning and drying the alloy workpiece. The chemical polishing solution is characterized in that sodium persulfate is taken as the oxidizing agent, and no yellow smoke is generated in the polishing process, which is green and environmental friendly. The polishing solution is simple in components, and easy to control. The obtained chemically polished surface is bright and flat, and capable of achieving the mirror polishing effect. The polishing solution can be widely applied to polishing the surface of the copper alloy.

Description

technical field [0001] The invention relates to a chemical polishing solution, in particular to an alloy surface polishing treatment method and a chemical polishing solution. Background technique [0002] Alloys, such as stainless steel, brass, and aluminum alloys, are widely used in decorative finishing products, mechanical parts, and tool products. During the processing of these parts and the formation of final products, polishing treatment is required to improve surface roughness and brightness. At present, the main alloy polishing technologies are: electrochemical polishing, chemical polishing and mechanical polishing. Compared with the other two, chemical polishing is widely used due to its low cost, simple operation and uniform polishing effect, and is especially suitable for polishing parts with complex shapes. [0003] The chemical polishing liquid used in production today, if classified according to the oxidizing agent used, mainly has the following three types: (...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23F3/00
Inventor 曾德长郑惠丰余红雅刘仲武匡同春
Owner SOUTH CHINA UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap