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Ultra-high numerical aperture lithography imaging polarization compensation device and method

A technology of numerical aperture and compensation device, which is applied in photolithography exposure device, microlithography exposure equipment, optics, etc., can solve the problems that cannot meet the requirements of lithography imaging, etc., achieve simple and convenient design, improve resolution, and increase CDU Effect

Active Publication Date: 2018-02-06
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology

With the continuous improvement of NA of immersion projection objective lens, the IPS achieved by the control of illumination polarization is generally less than 95%, while the polarization requirement of ultra-high NA requires IPS to be greater than 97%, which cannot meet the requirements of lithography imaging.

Method used

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  • Ultra-high numerical aperture lithography imaging polarization compensation device and method
  • Ultra-high numerical aperture lithography imaging polarization compensation device and method
  • Ultra-high numerical aperture lithography imaging polarization compensation device and method

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Embodiment Construction

[0025] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0026] Aiming at the technical defects existing in the prior art, the technical problem to be solved in the present invention is to provide a polarization compensation control device for ultra-high numerical aperture lithography, and place a polarization compensation device on the pupil plane of the projection objective lens to perform polarization modulation on the imaging beam , the purpose is to compensate the polarization aberration effect on the PO optical path in the ultra-high NA lithography imaging system, precisely control the polarization state, and improve the lithography effect.

[0027] figure 1 It is a structural schematic diagram of a lithography machine using a polarization compensation device for ultra-high numerical aperture lithography imaging. The lithographic apparatus 100 includes a light source 1 , an illumination syste...

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Abstract

The invention discloses a polarization compensation device and method for ultra-high numerical aperture lithography imaging, wherein the device includes: a polarization compensation unit placed on the pupil plane of the projection objective lens of the lithography device and polarizing the outgoing light beam of the projection objective lens Modulation; a polarization detection device, located on the image plane of the projection objective lens, to detect the polarization state of the field of view point of the projection objective lens; a polarization control unit, used to control the polarization subunit. Compared with the existing technology, the present invention can effectively increase the expected polarized light intensity to more than 97%, meet the polarization requirements of ultra-high numerical aperture NA, and realize the requirements of resolution and critical size uniformity CDU.

Description

technical field [0001] The invention belongs to the technical field of step-scanning projection lithography machine lithography imaging technology for ultra-large-scale integrated circuit production equipment, and in particular relates to a polarization compensation device and method for ultra-high numerical aperture lithography imaging. Background technique [0002] With the development of projection lithography technology, the performance of the projection optical system of lithography machines has been gradually improved. At present, lithography machines have been successfully used in the field of integrated circuit manufacturing with submicron and deep submicron resolution. When using a lithography machine to manufacture integrated circuit chips, the projection objective lens is required to have a higher resolution in order to realize the preparation of highly integrated chips. In order to meet the higher resolution requirements of the projection light objective, it is n...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02F1/03
Inventor 孙文凤
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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