Oxide sputtering target and protective film for optical recording medium

Abstract

This invention provides an oxide sputtering target, as used for forming an optical recording medium protective film, capable of forming a flexible, difficult-to-crack film with high storage ability, and capable of direct-current sputtering with few particles during sputtering. The oxide sputtering target is an oxide sintered body containing, with respect to the total amount of metal component, at least a total of 0.15at% of at least one of Al, Ga, and In, at least 7at% of Sn, and no more than a total of 36at% of Al, Ga, In, and Sn, the remainder comprising Zn and unavoidable impurities.

Description

technical field [0001] The present invention relates to an oxide sputtering target for forming a protective film for optical recording media used in optical recording media such as CD, DVD, Blu-ray Disc (registered trademark: hereinafter referred to as BD), and the use of the oxide sputtering target. Protective film for optical recording medium formed by object sputtering target. [0002] This application claims priority based on Patent Application No. 2012-023397 filed on February 6, 2012 and Patent Application No. 2013-010035 filed in Japan on January 23, 2013, the contents of which are incorporated herein by reference. Background technique [0003] In recent years, with the improvement of the image quality of photos and movies, the digital data recorded on the optical recording medium has increased, and the capacity of the recording medium has been increased. Conventionally, as a high-capacity optical recording medium, multi-layer The recording method has an optical reco...

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Problems solved by technology

[0009] However, as described in the above-mentioned Patent Document 2, if ZnS-SiO 2 If the sulfur (S) component is contained in the film, the reflectance decreases due to the reaction of the sulfur with the metal in the reflective film, and as a result, there is a problem that the storage stability of the optical recording medium is reduced.

In addition, when ITO is used, many particles are generated during sputtering, which adversely affects the recording film of the recording medium. In addition, cleaning of the production equipment is very troublesome, and there is a problem that the productivity of the recording medium deteriorates.

In addition, Patent Document 3 proposes a sputtering target mainly composed of tin oxide having a tin oxide phase, zinc oxide, and oxides of trivalent or higher elements, but the tin oxide phase in the structure causes nodules, and there are Problems causing particle generation when sputtering

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