lpcvd furnace tube and its main valve interlock device circuit
A technology of interlocking device and circuit, applied in the direction of hardware monitoring, etc., can solve the problems of termination, innumerable, and failure to establish pre-vacuum, and achieve the effect of preventing and improving particles
Active Publication Date: 2016-09-14
ADVANCED SEMICON MFG CO LTD
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Problems solved by technology
In this process, the pre-vacuum may not be established due to various failures of the furnace tube equipment, and the main valve will be opened directly to establish the deposition vacuum after 5 minutes, which will cause too much turbulence in the furnace tube and cause crystallization. Numerous particles on the disc
[0003] One of the reasons for the above problems is that the pre-vacuum cannot be established due to deposits in the inlet hole of the auxiliary valve in the main valve. However, in the prior art, the LPCVD furnace tube cannot be established when the pre-vacuum cannot be established or the desired value cannot be obtained. Timely termination of the process
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[0057]The present invention will be further described below in conjunction with the specific embodiments and the accompanying drawings. In the following description, more details are set forth in order to fully understand the present invention, but the present invention can obviously be implemented in many other ways different from this description. , those skilled in the art can make similar promotions and deductions based on actual application situations without violating the connotation of the present invention, so the content of this specific embodiment should not limit the protection scope of the present invention.
[0058] Embodiment of the main valve interlocking device circuit of LPCVD furnace tube
[0059] figure 1 It is a topological structure diagram of the main valve interlocking device circuit of the LPCVD furnace tube of an embodiment of the present invention; figure 2 for figure 1 A schematic diagram of a switch in the circuit of the main valve interlocking d...
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The invention provides a LPCVD furnace tube and its main valve interlocking device circuit, the input end of the circuit is connected to a vacuum detector, and the output end corresponds to the process termination part of the furnace tube; the circuit adopts dual power supply input; the circuit includes: the first One resistance, one end receives the vacuum detection signal; the second resistance and the potentiometer are connected in series between the positive power supply end and the ground end, from which the action voltage of the comparator corresponding to the set value of the pre-vacuum of the furnace tube is provided; the comparator, the positive The input terminal is connected between the second resistor and the potentiometer, and the negative input terminal is connected to the other end of the first resistor; the comparator is also connected to the positive and negative power supply terminals respectively; one end of the third resistor is connected to the output terminal of the comparator; the triode, the base The electrode is connected to the other end of the third resistor, and the emitter is grounded; one end of the relay is connected to the collector of the triode, and the other end is connected to the positive power supply end; the fourth resistor is connected to the collector of the triode at one end; the status display element is connected to the fourth resistor The other end is connected, and the other end is connected to the positive power supply end.
Description
technical field [0001] The invention relates to the technical field of semiconductor manufacturing equipment, in particular, the invention relates to an LPCVD furnace tube and a main valve interlocking device circuit thereof. Background technique [0002] LPCVD (low pressure chemical vapor deposition) furnace tube will first open the small valve (secondary valve) to establish a pre-vacuum after entering the furnace, and then open the large valve (main valve) to establish a deposition vacuum after 5 minutes. In this process, the pre-vacuum may not be established due to various failures of the furnace tube equipment, and the main valve will be opened directly to establish the deposition vacuum after 5 minutes, which will cause too much turbulence in the furnace tube and cause crystallization. There are countless particles on the disc. [0003] One of the reasons for the above problems is that the pre-vacuum cannot be established due to deposits in the inlet hole of the auxili...
Claims
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IPC IPC(8): G06F11/32
Inventor 杨力勇沈震
Owner ADVANCED SEMICON MFG CO LTD