Oblique incidence high-reflection film laser electric field distribution design method

A high-reflection film and design method technology, applied in optics, optical components, instruments, etc., can solve problems such as inability to optimize electric field distribution

Inactive Publication Date: 2015-02-04
THE 3RD ACAD 8358TH RES INST OF CASC
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In summary, after half a century of development, the electric field distribution control design of laser high reflective film

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Oblique incidence high-reflection film laser electric field distribution design method
  • Oblique incidence high-reflection film laser electric field distribution design method
  • Oblique incidence high-reflection film laser electric field distribution design method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0044] The basic structure of the film is as described above. The following is an example design for a 632.8nm laser film, the incident angle is 45°, and the polarization state is S polarization:

[0045] 1. High-reflection film structure design steps:

[0046] 1) Set the wavelength of the laser to 632.8nm, the working angle to 45°, and the high refractive index material to be Ta 2 o 5 , the low refractive index material is SiO 2 ; The refractive indices of high refractive index and low refractive index film materials are respectively n H = 2.10 and n L =1.47; the extinction coefficients of high refractive index and low refractive index film materials are k respectively H =2×10 -5 and k L =1×10 -6 ;

[0047] 2) The calculated optical thickness coefficients of the high refractive index and low refractive index films are α=1.0620 and β=1.1406, respectively;

[0048] 3) Set the basic period of the film as m=17; then the corrected film structure is: substrate / (1.062H 1.1...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention belongs to the technical field of film electric field distribution design, and in particular relates to an oblique incidence high-reflection film laser electric field distribution design method. The invention provides a high-reflection film laser electric field distribution design method which comprises the following steps: pre-setting the extinction coefficient of a film material, optimizing the absorption rate of a high-reflection film system structure through values, and controlling the absorption rate to be minimum, thereby distributing a laser electric field, and finally preventing a film boundary from intensity electric field distribution. By adopting the scheme, a high-reflection film laser electric field distribution design in oblique incidence can be achieved; by adjusting the electric field distribution of laser, the film boundary is prevented from an intensive electric field, the absorption rate can be controlled to be minimal, the anti-damage threshold of laser can be increased, and the absorption loss can be reduced.

Description

technical field [0001] The invention belongs to the technical field of designing electric field distribution of thin films, and in particular relates to a design method for electric field distribution of obliquely incident high-reflection thin film lasers. Background technique [0002] In the design and preparation of laser-damage-resistant optical films, people first care about the good spectral characteristics of the film, and the second is to increase the threshold of laser-damage resistance. A large number of research results have proved that the laser electric field distribution in the thin film has a strong correlation with the laser damage resistance threshold, so adjusting the laser electric field distribution can help improve the laser damage resistance threshold. Therefore, the analysis and theoretical research on the internal field strength distribution of high reflection films has become an important topic in the research of anti-laser films. [0003] The calcul...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B27/00
CPCG02B27/0012
Inventor 刘华松季一勤刘丹丹王利栓姜玉刚姜承慧
Owner THE 3RD ACAD 8358TH RES INST OF CASC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap