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Distortion measurement device and distortion correction method of wave aberration measurement module

A measurement module and measurement device technology, which is applied in the direction of photolithography exposure device, test optical performance, micro-lithography exposure equipment, etc., can solve the problem of unable to measure the overall distortion of the wave aberration measurement module, to achieve increased complexity, Improved accuracy, simple effect of distortion measurement system

Active Publication Date: 2017-12-01
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

However, this method can only measure the distortion of the CCD alone, and cannot measure the overall distortion of the wave aberration measurement module

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  • Distortion measurement device and distortion correction method of wave aberration measurement module
  • Distortion measurement device and distortion correction method of wave aberration measurement module
  • Distortion measurement device and distortion correction method of wave aberration measurement module

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[0039] In order to better understand the purpose, technical solutions and advantages of the embodiments of the present invention, the present invention will be further described below in conjunction with the accompanying drawings and embodiments, but the protection scope of the present invention should not be limited thereby.

[0040] figure 1 Shown is a distortion measurement device of a wave aberration measurement module. The light source or the wave aberration optical system module 1 to be measured emits spherical waves, which are perpendicularly incident on the standard template 2 , and thereafter, the incident light carries the position information of the calibration mark on the standard template 2 . The light beam continues to propagate to the wave aberration measurement module 3, and becomes a group of parallel lights after being collimated by the Fourier lens 3-1 inside the wave aberration measurement module 3. Due to the distortion of the Fourier lens 3-1 itself, the...

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Abstract

The invention discloses a distortion measurement device and a distortion correction method of a wave aberration measurement system. The device includes: a light source, a standard template, a wave aberration measurement module, a precision adjustment platform and a data processing unit. The wave aberration measurement module is composed of Fourier The lens and the image acquisition element are jointly composed, and the standard template is used in the distortion measurement of the wave aberration measurement module. In the present invention, a standard template is placed between the light source and the wave aberration measurement module, and a high-precision positioning mark with a known position is made on the standard template, and an image is collected by an image acquisition component and output to a data processing unit. The data processing unit performs image recognition of positioning marks on the image, and then performs distortion mapping calculations, and performs distortion position correction and wave aberration data correction on the wave aberration measurement results to improve wave aberration measurement accuracy. For interferometry and The non-interferometric wave aberration measurement module is suitable for distortion measurement.

Description

technical field [0001] The invention relates to a distortion measurement method of an optical system, in particular to a measurement device and a distortion correction method for the distortion of a wave aberration measurement module. Background technique [0002] For the objective lens imaging system or the wave aberration high-precision detection system of the spherical wave light source, how to remove the measurement system error and improve the detection accuracy is the research goal of the high-precision wave aberration detection system. For the wave aberration measurement system, the systematic error introduced by the measurement system itself is removed by means of two measurements. For example, a high-precision system wave aberration detection method proposed in the Chinese Patent Application Publication (Application No. 201110346849.0, Publication No. CN 102368139A), and a measurable system proposed in the Chinese Patent Application Publication (Application No. 2009...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01M11/02G03F7/20
Inventor 卢云君唐锋王向朝
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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