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Cleaning device of polishing pad finishing disc

A technology for cleaning devices and dressing discs, which is applied to grinding/polishing equipment, abrasive surface adjustment devices, cleaning methods using tools, etc., can solve problems such as weak cleaning effect, to ensure the surface, avoid abnormal grinding rate, and maintain the process Stability and Product Safety Effects

Active Publication Date: 2015-03-18
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The cleaning device of the common polishing pad dressing disc has a weak cleaning effect on the surface of the polishing pad dressing disc with a long grinding time, and basically can only keep its surface wet

Method used

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  • Cleaning device of polishing pad finishing disc
  • Cleaning device of polishing pad finishing disc
  • Cleaning device of polishing pad finishing disc

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0065] Cleaning devices for polishing pad conditioning discs, such as figure 2 , image 3 , Figure 4 , Figure 5 , Figure 6 As shown, it includes a cleaning cup 7, a cleaning brush carrying device 5, a cleaning brush 8, a central nozzle 10, a first valve, a power pure water pipeline, a drive shaft, a bearing, a cylinder, a motor, and a controller;

[0066] The cleaning brush 8 is fixed on the top surface of the cleaning brush carrying device 5;

[0067] The upper end of the bearing is fixed on the middle part of the bottom surface of the cleaning brush carrying device 5, and the lower end passes through the bottom of the cleaning cup 7 and is connected to the cylinder;

[0068] The cylinder is used to drive the bearing to move up and down;

[0069] The drive shaft is provided with a through hole along the axis;

[0070] The drive shaft is pivotally fixed in the bearing, the upper end passes through the center of the cleaning brush carrying device 5 and is fixed togeth...

Embodiment 2

[0078] The cleaning device based on the polishing pad conditioning disc of Embodiment 1 also includes an edge nozzle 2 and a second valve;

[0079] The edge nozzle 2 is arranged above the outer side of the cleaning cup 7 for spraying divergent water mist;

[0080] One end of the second valve communicates with the edge nozzle 2, and the other end communicates with the power pure water pipeline;

[0081] The controller is further configured to control the action of the second valve according to the cleaning trigger signal and the cleaning end signal.

[0082] The deionized water sprayed by the edge nozzle 2 can clean the side of the polishing pad conditioning disc.

Embodiment 3

[0084] Based on the cleaning device of the polishing pad conditioning disc of the second embodiment, the side wall of the cleaning cup 7 is provided with an overflow hole; the bottom of the cleaning cup 7 is provided with a drain valve 6;

[0085] The drain valve 6 is connected to the inside of the cleaning cup 7 at the upper end, and connected to the outside of the cleaning cup 7 at the lower end;

[0086] The controller is also used to control the action of the drain valve 6 according to the cleaning trigger signal and the cleaning end signal.

[0087] In the cleaning device of the polishing pad dressing disc in the third embodiment, the setting of the overflow hole can limit the height of the liquid level in the cleaning cup, and the setting of the drain valve can drain the liquid in the cleaning cup.

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Abstract

The invention discloses a cleaning device of a polishing pad finishing disc. The cleaning device of the polishing pad finishing disc comprises a cleaning cup, a cleaning brush bearing device, a cleaning brush, a central spray nozzle, a first valve, a pure water power pipe, a driving shaft, a bearing, an air cylinder, a motor and a controller, wherein the cleaning brush is fixed onto the top surface of the cleaning brush bearing device; the upper end of the bearing is fixed onto the cleaning brush bearing device, and the lower end of the bearing is connected to the air cylinder; the air cylinder drives the bearing to move up and down; the driving shaft is provided with a through hole and fixedly pivoted into the bearing, the upper end of the driving shaft penetrates and extends out of the cleaning brush bearing device, and the lower end of the driving shaft is connected to the motor; the motor is fixed inside the bearing for driving the driving shaft to rotate; the central spray nozzle is fixed at the upper end of the driving shaft and communicated with the through hole of the driving shaft; the first valve is connected to the through hole between the lower end of the driving shaft and the pure water power pipe; the pure water power pipe is used for providing high-pressure deionized water; the controller is used for controlling the air cylinder, the motor and the first valve to work according to cleaning triggering signals and cleaning stopping signals. The cleaning device of the polishing and finishing disc can keep the surface of the polishing pad finishing disc clean.

Description

technical field [0001] The invention relates to semiconductor manufacturing equipment, in particular to a cleaning device for a polishing pad conditioning disk. Background technique [0002] Chemical mechanical polisher (CMP) process, pressurizes the back of the silicon wafer, and uses the polishing pad to grind the front side of the silicon wafer with chemical abrasive slurry. During the grinding process, a conditional disk (CD) is required for the polishing pad. Dressing the polishing pad in real time, the polishing pad dressing disc is prone to crystallization in the gaps between the diamond particles on the surface of the polishing pad dressing disc due to contact with the waste and abrasive slurry ground by the polishing pad. There are too many crystals on the polishing pad dressing disc, which cannot effectively dress the polishing pad. The polishing pad without effective dressing will cause abnormal grinding rate of the silicon wafer and cause micro scratches on the s...

Claims

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Application Information

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IPC IPC(8): B24B53/017B08B7/04
CPCB08B3/02B08B7/04B24B53/017B08B1/32
Inventor 祝志敏张震宇
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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