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A chemical etching process

A technology of etching and process, applied in the field of material surface treatment, can solve problems such as product scrapping, and achieve the effects of increased pass rate, improved efficiency, and simplified process

Active Publication Date: 2017-01-04
UNION OPTECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If any step is wrong, it will cause irreparable defects on the surface of the product, resulting in product scrapping

Method used

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  • A chemical etching process
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  • A chemical etching process

Examples

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Effect test

Embodiment 1

[0028] A chemical etching process, comprising the following steps:

[0029] A: Polishing and polishing: Polish the metal product 1 with 1200# sandpaper until it is bright, and remove the surface oxide film. The metal product 1 is S136 stainless steel. After heat treatment, its hardness reaches HRC 52. The etched area needs to be a plane of 100*150mm square. If the metal product 1 itself is bright, this step can be omitted;

[0030] B: Scrubbing: Use a dust-free paper dipped in alcohol to wipe off the 100*150mm square plane area on the metal product 1 that needs to be etched, and use tape 4 (3M brand shielding tape can be used) to stick it on the metal product 1 that needs to be etched Protect the places outside the area to prevent the etching potion 3 from being sprinkled on places that do not need to be etched in the subsequent steps;

[0031] C: Make oil film: Apply oil film 2 evenly on the metal product 1 where the pattern needs to be etched; use a dust-free paper to dip a...

Embodiment 2

[0037] A chemical etching process, the metal product 1 is a common common material 45# steel, the hardness is HRC 28 without heat treatment, and the etched area is a concave area of ​​85*97mm square, including the following steps:

[0038] A: Scrub: Wipe the metal product 1 with a dust-free paper dipped in alcohol, because the metal product 1 has been milled, the surface is bright and does not need to be polished, so just use a dust-free paper dipped in alcohol to wipe it clean;

[0039] B: Paste and protect the periphery outside the concave area with adhesive tape 4, then trim the adhesive tape 4 with a blade to ensure that the etched area is 85*97mm square;

[0040] C: Make oil film: Apply oil film 2 evenly on the metal product 1 where the pattern needs to be etched; spray dimethyl silicone oil on the dust-free paper with a spray gun, until the paper towel is transparent and there are no excess oil droplets, use dust-free paper to wipe Apply simethicone evenly on the etched ...

Embodiment 3

[0046] A chemical etching process, the metal product 1 is a wave-shaped product stamped from 304 stainless steel plate, the workpiece size is 170*80mm, the difference between the peak and the trough is 15mm, and the wavelength is 45mm, including the following steps:

[0047] A: Grind the surface of the metal product 1 and polish it with 1200# sandpaper until the surface is bright;

[0048] B: Scrubbing: Wipe the metal product 1 clean with dust-free paper dipped in acetone, because the entire surface of the metal product 1 needs to be etched and sanded, so there is no need to apply tape 4 for protection;

[0049] C: Make oil film: Apply oil film 2 evenly on the area to be etched on metal product 1, wet the dust-free paper with dimethyl silicone oil in a watering can, and evenly apply silicone oil on the surface of metal product 1 with dust-free paper;

[0050] D: Chemical etching: Spray 60ml of etching liquid 3 evenly on the oil film 2. The etching liquid 3 is dispersed into in...

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Abstract

The invention discloses a chemical ripple etching technique which comprises the following steps: A: scrubbing: scrubbing the region to be etched on the metal product with a bright surface; B: oil film making: uniformly coating an oil film on the region to be etched on the metal product; C: chemical etching: uniformly spraying an etching solution on the oil film, wherein the etching solution on the oil film is dispersed into independent drops due to self surface tension, and the places on the metal product corresponding to the etching solution are etched so that the metal product surface form sand ripples; D: when the sand ripples on the product obtained after the step C satisfy the requirements, flushing the ripple etching region with clear water; and E: blow-drying: blow-drying the product obtained in the step D. The technique is simple and efficient, can observe the ripple etching progress at any time, greatly lowers the cost, enhances the efficiency and improves the quality.

Description

[0001] 【Technical field】 [0002] The invention relates to a chemical etching process, which belongs to the technical field of material surface treatment. [0003] 【Background technique】 [0004] Chemical etching is to use different techniques to form various patterns, lines, or patterns on the surface of metal products through the action of chemical potions. Therefore, it can be used for various purposes such as matting, decoration, and anti-skid, especially in mold, electronics, hardware and other industries. Its advantages are various pattern styles, clear lines, strong adhesion and excellent wear resistance. It has an irreplaceable important position in various industries. [0005] However, due to the high complexity of the process and the cumbersome operation, a small defect often leads to a great discount or even scrapping of the entire product in terms of usability or appreciation. This is especially true for sand surface textures with high requirements. The formation...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/02C23F1/16
Inventor 谢燕宇龚俊强
Owner UNION OPTECH