Test Structure for Breaking Strength of Thin Film Materials
A technology for testing structures and thin-film materials, applied in the direction of applying stable tension/pressure to test the strength of materials, etc., can solve the problems that it is difficult to realize direct loading of test signals and electrical detection, etc., to achieve stable test process and test parameter values, and calculation methods Simple, low-equipment-required effect
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[0019] Attached below figure 1 The present invention will be further described.
[0020] The invention provides a test structure for measuring the breaking strength of thin film materials. The test structure consists of three parts: a thermal expansion drive unit 101; a micrometer vernier 103 with a damping structure; and a tensile beam unit 102 made of the film material to be tested. Wherein, the main body material of the thermal expansion driving unit 101 and the micrometer vernier 103 with a damping structure is polysilicon.
[0021] The thermal expansion driving unit 101 is a gate-shaped structure, including two anchor areas, namely the first anchor area 101-1, the second anchor area 101-2, two horizontal long beams, namely the first horizontal long beam 101-3, the second horizontal long beam Two horizontal long beams 101-4, one vertical wide beam 101-5. The right ends of the two horizontal long beams are respectively vertically connected to the upper and lower ends of ...
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