Magnetron sputtering coating equipment and preparation method of ito glass
A magnetron sputtering coating and glass technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating and other directions, can solve the problems of difficulty in meeting flexible display products, insufficient flexibility, etc.
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[0037] see figure 2 , a method for preparing ITO glass according to an embodiment includes the following steps S110 to S30.
[0038] Step S110: providing a glass substrate.
[0039] The glass substrate can be float glass or other conventional glass in this field. Wash and dry the glass substrates for later use.
[0040] Step S120: Fixing the glass substrate on the substrate frame. The substrate frame moves into the coating chamber 10 of the above-mentioned magnetron sputtering coating equipment 100, and the ITO thin film is prepared on the glass substrate by magnetron sputtering, wherein the set temperature of the coating chamber is 380°C-600°C.
[0041] Preferably, the magnetron sputtering coating is performed at a vacuum degree of 0.1 Pa to 0.5 Pa. The set temperature of the coating chamber is 380-600°C.
[0042] Preferably, during the coating process, the running speed of the glass substrate is 0.6m / min˜2.5m / min.
[0043] The sputtering voltage of the ITO target for ...
Embodiment 1
[0060] Preparation of ITO glass
[0061] 1. Clean and dry the glass substrate for later use.
[0062] 2. Run the clean and dry glass substrate into the coating chamber of the magnetron sputtering coating equipment, and prepare the ITO film on the glass substrate by magnetron sputtering. The set temperature of the coating chamber is 600°C, vacuum The temperature is 0.3Pa, the operating speed of the glass substrate is 1.8m / min, the voltage of magnetron sputtering is 315V, and the power is 6Kw.
[0063] 3. Run the glass substrate coated with ITO film through the first transition chamber, the second transition chamber, the buffer chamber and the exit lock chamber in sequence, and then run out of the magnetron sputtering coating equipment to obtain ITO glass; wherein, the first transition chamber is controlled by the heater The temperature of the transition chamber is 400°C, the temperature of the second transition chamber is 350°C, the temperature of the buffer chamber is 300°C a...
Embodiment 2
[0065] Preparation of ITO glass
[0066] 1. Clean and dry the glass substrate for later use.
[0067] 2. Run the clean and dry glass substrate into the coating chamber of the magnetron sputtering coating equipment, and prepare the ITO film on the glass substrate by magnetron sputtering, wherein the coating temperature is 480°C and the vacuum degree is 0.2Pa. The operating speed of the glass substrate is 1.6m / min, the voltage of the magnetron sputtering is 350V, and the power is 48Kw.
[0068] 3. Run the glass substrate coated with ITO film through the first transition chamber, the second transition chamber, the buffer chamber and the exit lock chamber in sequence, and then run out of the magnetron sputtering coating equipment to obtain ITO glass; wherein, the first transition chamber is controlled by the heater The temperature of the transition chamber is 400°C, the temperature of the second transition chamber is 350°C, the temperature of the buffer chamber is 300°C and the t...
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Abstract
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