mirror array in digital pattern generator (dpg)

Abstract

Systems and methods for digital pattern generators (DPGs) with mirror arrays in electron beam lithography systems are discussed. The mirror array includes a first mirror bank and a second mirror bank, wherein a combinatorial logic structure is interposed between the first mirror bank and the second mirror bank. Output data lines extend from the first reflective library mirror to the combinatorial logic structure. An input data line carrying data associated with the second mirror bank is also provided to the combinatorial logic structure. An output data line extends from the combinational logic structure to the second database.

Description

technical field [0001] The present invention relates generally to the field of semiconductor technology, and more particularly to electron beam lithography systems. Background technique [0002] The semiconductor integrated circuit (IC) industry has experienced rapid growth. In the course of IC evolution, functional density (ie, the number of interconnected devices per chip area) has generally increased while geometry size (ie, the smallest component (or line) that can be made using a fabrication process) has decreased. This shrinking process often offers advantages by increasing production efficiency and reducing associated costs. This scaling also increases the complexity of handling and manufacturing ICs, requiring similar developments in IC manufacturing for these advances to be realized. [0003] For example, as the semiconductor industry moves to smaller technology process nodes in pursuit of greater device density, higher performance, and lower cost, there are more ...

AI Technical Summary

Problems solved by technology

Specifically, this verification consumes more cost and time resources as the mirror array size increases

Therefore, although existing photolithographic methods generally meet the requirements, they do not meet the requirements in all aspects

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