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Pattern generator

A graphic generator and register technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of complex interface, limited data storage, high equipment cost, etc.

Inactive Publication Date: 2006-05-24
INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The device has the following deficiencies: first, the controller uses a traditional small computer with limited data storage and slow processing speed; a large-capacity storage device is used, resulting in high equipment cost; the device is very complicated in terms of interface, involving Interface methods such as SCSI interface, VSB interface and VME interface; graphics processing is mainly realized by FPGA unit, which has defects in processing speed and expansion performance; the patent does not explain how to realize the functions of exposure scanning and mark alignment

Method used

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Embodiment Construction

[0017] The present invention will be described below in conjunction with the accompanying drawings and embodiments.

[0018] Such as figure 2 The present invention shown is composed of an interface circuit 1, a dual-port storage circuit 2, a digital signal processing circuit 3, a digital-to-analog conversion circuit 4, an exposure / mark detection control circuit 5, a mark detection circuit 6, a final exposure data register unit 7, and a beam gate control circuit 8 composition. The interface circuit 1 is respectively connected with the dual-port storage circuit 2, the exposure / mark detection control circuit 5, and the digital signal processing circuit 3 is respectively connected with the dual-port storage circuit 2, the exposure / mark detection control circuit 5, the mark detection circuit 6, and the final exposure data register The unit 7 is connected to the beam gate control circuit 8 ; the final exposure data register unit 7 is connected to the digital-to-analog conversion c...

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Abstract

The utility model relates to a pattern generator, which is used in an exposure machine for charged particles such as electron beams and ion beams, and belongs to the pattern generator hardware of the exposure machine. The utility model provides a pattern generator for exposure machines with fast calculation speed, simple interface, low power consumption and various functions. It uses a high-speed digital signal processor as the core and realizes communication with a host computer through a universal serial bus interface. The pattern generator can not only meet the exposure format with triangle, rectangle and trapezoid as the basic exposure unit graphics, but also add circle and ring as the basic exposure unit graphics, which solves the defects in the processing speed and precision of integrated grating devices. The utility model is composed of an interface circuit, a dual-port memory circuit, a digital signal processor circuit, a digital-to-analog conversion circuit, an exposure / mark detection control circuit, a mark detection circuit, a final exposure data register unit and a beam gate control circuit.

Description

technical field [0001] The present invention relates to the control equipment of all charged particle exposure machines such as electron beams and ion beams. Specifically, the present invention belongs to the hardware of the pattern generator of the exposure machine, especially the pattern generator used in the electron beam exposure machine. Background technique [0002] Electron beam exposure system is an indispensable large-scale precision equipment for the research and development of microelectronics industry and other microfabrication. The pattern generator is a key component in this system. It is located between the computer and the high-precision deflection amplifier. Its main function is to process the unit graphic data sent by the computer, and the hardware unit in the graphic generator will sequentially generate the X and Y coordinate values ​​of each point to be exposed. These values ​​are then converted into corresponding analog quantities through a high-speed, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
Inventor 方光荣张鹏薛虹商涛林滢
Owner INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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