Microwave-plasma chemical vapor deposition equipment

Abstract

The invention provides microwave-plasma chemical vapor deposition equipment. The microwave-plasma chemical vapor deposition equipment comprises a microwave source, a first waveguide tube, a microwave mode converter and a resonance device, wherein one end of the first waveguide tube is connected with the microwave source, and the other end of the first waveguide tube is connected with the microwave mode converter; the resonance device comprises a resonance cavity and a microwave gathering unit, the top of the resonance cavity is provided with a medium window, the microwave mode converter is located on the upper part of the medium window, can perform mode conversion on microwave from the microwave source, and can transfer the microwave to the resonance cavity through the medium window, a base is arranged in the resonance cavity, a substrate is supported on the base, the supported substrate can be located below the medium window due to the arrangement of the substrate, and the microwave gathering unit is arranged on the resonance cavity and can gather the microwave transferred to the resonance cavity on the substrate. According to the microwave-plasma chemical vapor deposition equipment, through the arrangement of the microwave gathering unit, the distribution area of a microwave electric field on the substrate is expanded, so that microwave energy can be better concentrated on the area above the substrate, and deposition of a large-area diamond film is facilitated.

Description

technical field [0001] The invention relates to a chemical vapor deposition equipment, in particular to a microwave plasma chemical vapor deposition equipment. Background technique [0002] Diamond is a mineral composed of carbon, which has excellent mechanical, thermal, chemical, electrical, acoustic and optical properties such as high hardness, high thermal conductivity, low thermal expansion coefficient, high chemical inertness, and high transmittance. It has extremely broad application prospects in research and industry. Due to the scarcity of natural diamonds and the relative difficulty of artificial preparation, people began to study the synthesis of diamond films under low temperature and low pressure conditions. [0003] At present, a variety of methods for preparing diamond films by chemical vapor deposition have been developed, mainly including hot wire method, flame method, DC arc method, microwave method and so on. The hot wire method has defects such as contam...

AI Technical Summary

Problems solved by technology

[0008] The invention provides a microwave plasma chemical vapor deposition equipment, which is used to solve the technical defects of the prior art, such as relatively low deposition area of ​​deposition equipment, difficulties in chamber replacement and maintenance, and potential safety hazards in the preparation process.

Images