Radio frequency filter and semiconductor processing device

Abstract

The invention provides a radio frequency filter and a semiconductor processing device. The radio frequency filter is used for filtering radio frequency signals, which are returned by a radio frequency power source connected with an electrostatic chuck to a DC (direct current) power source connected with the electrostatic chuck. The radio frequency filter comprises an inductor element and a capacitor element, wherein the inductor element is a magnetic core inductor. The radio frequency filter can filter low-frequency radio frequency signals as well as high-frequency radio frequency signals simultaneously and accordingly can filter two or more radio frequency signals with large frequency differences, thereby enhancing the applicability.

Description

technical field [0001] The invention belongs to the technical field of semiconductor equipment manufacturing, and in particular relates to a radio frequency filter and semiconductor processing equipment. Background technique [0002] In the manufacturing process of semiconductor devices, an electrostatic chuck (ESC) is usually used to generate electrostatic attraction to attract the semiconductor wafer on it, so as to realize deposition, etching, etc. on the surface of the semiconductor wafer as the substrate. crafting process. [0003] Specifically, a lower electrode is provided in the ESC, and the lower electrode is electrically connected to a direct current power supply DC, and the direct current power supply DC is used to provide a certain direct current bias voltage to the lower electrode, so that the ESC generates electrostatic attraction to adsorb the substrate; and, because Processes such as deposition and etching on the surface of the substrate are carried out in a...

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Problems solved by technology

Moreover, in practical applications, the radio frequency power source RF often outputs not only high-frequency power signals, but also low-frequency power signals, so as to generate plasma by means of high-frequency power signals (for example, 40MHz, 60MHz), and by means of low-frequency power signals (for example, , 20MHz) to control the energy of the plasma incident on the surface of the substrate. Therefore, the radio frequency filter 11 needs to filter two or more radio frequency signals with greatly different frequencies at the same time, but due to the characteristics of the air core inductor itself, increasing The inductance value of the large air-core inductor can filter low-frequency RF signals, but it will reduce the self-resonant frequency of the RF filter, which makes the RF filter unable to filter high-frequency RF signals; reduce the air-core inductance The inductance value of the RF filter can increase the self-resonant frequency of the RF filter, and the increase of the self-resonant frequency allows the RF filter to filter high-frequency RF signals, but due to the reduction of the inductance value of the air core inductor, it cannot be used for low-frequency RF signals. filtering

[0005] It can be seen from the above that the RF filter using air core inductors cannot simultaneously filter two or more RF signals with greatly different frequencies.

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