Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Parallel plane distance measurement device and measurement method

A measuring device and parallel plane technology, which is applied in the direction of mechanical gap measurement, photolithography exposure device, microlithography exposure equipment, etc., can solve the problems of large measurement error, reading error, deformation, etc., and achieve good consistency

Active Publication Date: 2015-07-15
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF5 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the system error of the post-type micrometer is more than ±0.01mm, and the angle between the post-type micrometer and the measurement plane is not perpendicular when the personnel operate manually, the contact force between the probe of the post-type micrometer and the measurement plane is too large The deformation of the measurement plane, the reading error of the operator when reading, etc., will all bring measurement errors, which will lead to large measurement errors in the current whole machine measurement and adjustment work, making accurate measurement impossible

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Parallel plane distance measurement device and measurement method
  • Parallel plane distance measurement device and measurement method
  • Parallel plane distance measurement device and measurement method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] The first embodiment of the present invention is figure 1 and 2 As shown, it is a schematic diagram of the single-group two-way adjustment turntable type plane distance measuring device 14 of the present invention. The single-group two-way adjustable turntable plane measuring device 14 of the present invention includes a bottom plate 1 , a turntable 2 and a positioning bracket 3 . The rotating table 2 has an adjustment range of 360° and an axial load of 25KG; it can carry the positioning bracket 3 and all parts on it for rotational movement. The positioning bracket 3 includes two heavy-duty one-dimensional differential head adjustment translation stages 4 with a stroke of 12.5mm, two fixed bases 5, two support rods 6, two rod-end chucks 7 and two lever-type precision dial gauges 8 . Adjust the stroke of the translation platform 4 to 12.5mm and carry 10KG. The two 12.5mm stroke heavy-duty one-dimensional differential head adjustment translation stages 4 can be adjuste...

Embodiment 2

[0039] In another embodiment of the present invention, use three groups of two-way adjustment turntable type plane measuring devices 15, such as image 3 and 4 shown. The three-group two-way adjustable turntable-type plane measuring device 15 of the present invention includes a bottom plate 1 , a rotary table 2 and three sets of positioning brackets 3 . The rotating table 2 has an adjustment range of 360° and an axial load of 25KG; it can carry the positioning bracket 3 and all parts on it for rotational movement. Each set of positioning brackets 3 includes two 12.5mm stroke heavy-duty one-dimensional differential head adjustment translation stages 4, two fixed bases 5, two support rods 6, two rod-end chucks 7 and two lever-type precision dial gauges 8. The 12.5mm stroke heavy-duty one-dimensional differential head adjustment translation platform 4 has a stroke of 12.5mm and a load capacity of 10KG; two 12.5mm stroke heavy-duty one-dimensional differential head adjustment tr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a parallel plane distance measurement device, which is characterized by comprising a bottom plate, a rotation table, a positioning support and a distance measurer, wherein a bidirectional adjusting measurement device is arranged on the positioning support; the rotation table can move in relative to the bottom plate to drive the bidirectional adjusting measurement device to rotate; and the distance between probes of the bidirectional adjusting measurement device is measured via the distance measurer. The invention also discloses a parallel plane distance measurement method. By adopting the bidirectional adjusting rotation table-type plane measurement device, the contact-type measurement precision is improved, and time consumption for measurement is reduced. The included angle between a measurement probe connection line and the measurement plane can be ensured via the measurement device, a measurement contact force can be adjusted online and consistency can be ensured to be good, and the device and the method can be applied to high precision contact-type parallel plane measurement in narrow space.

Description

technical field [0001] The invention relates to a measuring device and a measuring method for the distance between parallel planes, in particular to a measuring device and a measuring method for the distance between parallel planes applied in a narrow space. Background technique [0002] In the process of measuring and adjusting the whole lithography machine, there are many parallel planes when measuring the distance. Because of the small space, currently only measuring tools such as post-type micrometers can be used to measure manually. Since the system error of the post-type micrometer is more than ±0.01mm, and the angle between the post-type micrometer and the measurement plane is not perpendicular when the personnel operate manually, the contact force between the probe of the post-type micrometer and the measurement plane is too large The deformation of the measurement plane, the reading error of the operator when reading, etc. will all bring measurement errors, which wi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B5/14G03F7/20
Inventor 郭耸
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com