Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Velvet fabric with high fullness of shade

A technology of velvet and luster, which is applied in the field of velvet fabrics with high luster, can solve the problems of uneven tension in the warp and weft directions, low luster, and thick fabric, and achieve improved waterproof performance, high luster, and light and thin fabric Effect

Inactive Publication Date: 2015-07-22
JIANGSU HONGLIU BEDSHEET LIMITED
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, velvet cloth has uneven tension in the warp and weft directions and greater elasticity in the weft direction. In the process of using it as a fabric to manufacture products, it is easy to cause processing difficulties or material waste due to deformation caused by stretching. There are shortcomings such as not full and easy to be stretched
[0003] In addition, the fabrics used in traditional clothing have shortcomings such as poor elasticity, low color and heavy cloth quality.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Velvet fabric with high fullness of shade
  • Velvet fabric with high fullness of shade

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] see figure 1 and figure 2 , the present invention relates to a kind of high gloss velvet fabric, it comprises velvet cloth 1, and the bottom of this velvet cloth 1 is provided with sponge layer 2, and the bottom of sponge layer 2 is provided with antistatic layer 3, and this antistatic layer 3 is covered by core Made of silk fiber, the fiber includes yarn 3.1 and metal wire 3.2, the metal wire 3.2 is wound on the yarn 3.1, and the yarn 3.1 and metal wire 3.2 make the fabric have special rigidity after forming the core wire, and the bending can be change, shining metallic luster, delicate hand feeling, anti-static and anti-radiation effects, a base layer 4 is provided under the anti-static layer 3, and the adjacent two layers of the velvet cloth 1, sponge layer 2 and base layer 4 pass through Glue to bond.

[0018] Because the uppermost layer is velvet cloth, its surface color is elegant, rich and luxurious, firm and wear-resistant. At the same time, because the middl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to velvet fabric with high fullness of shade. The velvet fabric with high fullness of shade comprises velvet cloth (1), a sponge layer (2) is arranged under the velvet cloth (1), an anti-static layer (3) is arranged under the sponge layer (2) and made of core-spun yarn fibers, the fibers include yarns (3.1) and metal wires (3.2), the metal wires (3.2) are wound on the yarns (3.1), and a base layer (4) is arranged under the anti-static layer (3). The base layer is made of woven fabric comprises a base cloth layer, the base cloth layer is provided with a first surface and a second surface, at least one of the first and second surfaces of the base cloth layer is provided with a waterproof coating, and the base cloth layer is of a double-weft structure. The velvet fabric is graceful in luster, looks luxury, and is firm, durable, not prone to deformation, high in elasticity, breathable and high in fullness of shade, and can absorb humidity.

Description

technical field [0001] The invention relates to a velvet fabric with high luster. Background technique [0002] Velvet is the name of a silk fabric in which loops or piles are formed on the surface of the fabric by the velvet. There are two types of velvet: flower and plain. The surface of plain velvet is all pile loops, while flower velvet cuts part of the pile loops into fluff according to the pattern, so that it forms a pattern with the uncut pile loops. It can be used as warp with mulberry silk and cotton yarn. On the ground weaving weaving, mulberry silk or rayon is used for pile loops. The fluff or loops of velvet are densely erected, elegant in color and luster, rich and luxurious, durable and durable, and can be used to make clothing, hats, sofa covers, curtains, decorations, etc. However, velvet cloth has uneven tension in the warp and weft directions and greater elasticity in the weft direction. In the process of using it as a fabric to manufacture products, it i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A41D31/02B32B27/02B32B33/00B32B7/12
CPCA41D31/102A41D31/12A41D31/265B32B5/08B32B5/26B32B7/12B32B27/12B32B27/14B32B33/00B32B2255/00B32B2255/10B32B2262/0284B32B2262/103B32B2262/14B32B2307/21B32B2307/212B32B2307/406B32B2307/51B32B2307/54B32B2307/554B32B2307/724B32B2307/726B32B2437/00G21F3/02
Inventor 黄磊
Owner JIANGSU HONGLIU BEDSHEET LIMITED
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products