Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Spiral-like metal chiral metamaterial circular polarizer

A technology of chiral metamaterials and circular polarizers, applied in polarizing components, instruments, optics, etc., can solve problems such as narrow operating wavelength range of circular polarizers, and achieve high integration, good compatibility, stability and reliability high effect

Inactive Publication Date: 2015-08-26
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
View PDF4 Cites 40 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the present invention is to propose a helical metal-like chiral metamaterial circular polarizer to solve the problem that the traditional circular polarizer has a narrow operating wavelength range and is difficult to monolithically integrate with other linear polarization structures to form a full Stokes vector polarization detector device.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Spiral-like metal chiral metamaterial circular polarizer
  • Spiral-like metal chiral metamaterial circular polarizer
  • Spiral-like metal chiral metamaterial circular polarizer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] See figure 2 , the helical chiral metal metamaterial circular polarizer of this embodiment contains K 9 Glass substrate 1, SiO firmly bonded to the substrate 2 Spacer 2 and embedded in SiO 2 Four-layer helical-like aluminum microstructure array within the spacer layer 3 . The periods in the x and y directions are both p=200nm, the thickness of the spacer layer between the two layers is d=45nm, and the four up and down stacks contain some aluminum arcs with an angle of 120°. The size and height of each aluminum arc are the same as the inner diameter r i =57nm, outer diameter r o =93nm, thickness t=35nm, and rotate around the same central axis, the upper aluminum arc rotates 120° clockwise than the lower aluminum arc, the end of the lower aluminum arc and the head of the adjacent upper aluminum arc pass through a radius r c = 18nm aluminum cylinders are connected up and down to form a quasi-spiral shape; the structural unit is in the shape of a complete arc when view...

Embodiment 2

[0041] See figure 2 , the helical chiral metal metamaterial circular polarizer of this embodiment comprises a silicon substrate 1, a SiO spacer 2 firmly bonded to the substrate, and a four-layer helical metal chiral microstructure embedded in the SiO spacer array3. The periods in the x and y directions are both p=1280nm, the thickness of the spacer layer between the two layers is d=360nm, and the four up and down stacks contain some Au arcs with an angle of 120°. The size and height of each Au arc are the same as the inner diameter r i =464nm, outer diameter r o =604nm, thickness t=200nm, and rotate around the same central axis, the upper layer Au arc rotates 120° clockwise than the lower layer Au arc, the end of the lower layer Au arc and the head of the adjacent upper layer Au arc pass through a radius r c = 120nm Au cylinders are connected up and down to form a quasi-spiral shape; the structural unit is in the shape of a complete arc in the top view, the fourth layer of ...

Embodiment 3

[0049] See figure 2 , the helical chiral metal metamaterial circular polarizer of this embodiment comprises a Si substrate 1, a SiO spacer 2 firmly bonded to the substrate and a four-layer helical metal chiral microstructure embedded in the SiO spacer array3. The periods in the x and y directions are both p=2.2μm, the thickness of the spacer layer between the two layers is d=550nm, and the four up and down stacks contain some Cu arcs with an angle of 120°. The size and height of each Cu arc are the same as the inner diameter r i =550nm, outer diameter r o =1.05μm, thickness t=400nm, and rotated around the same central axis, the upper Cu arc is rotated 120° clockwise than the lower Cu arc, and the end of the lower Cu arc and the head end of the adjacent upper Cu arc pass through a radius r c = 250nm Cu cylinders are connected up and down to form a quasi-helical shape; the structural unit is in the shape of a complete arc in a top view, and the fourth layer of Cu arcs overla...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a spiral-like metal chiral metamaterial circular polarizer, which comprises a substrate, a transparent dielectric space layer firmly combined with the substrate and a spiral-like metal chiral micro structure array embedded in the transparent dielectric space layer, wherein the micro structure array comprises N periodically-arranged micro structure units, and N is more than 1 but no more than 106; the micro structure unit comprises m vertically-stacked metal arcs with the same size and with an angle of theta, the metal arcs are arranged rotarily around the same center, upper-layer metal arcs rotate for an angle of theta in relative to lower-layer metal arcs, theta is no less than 10 DEG but no more than 180 DEG, m is no less than 360 / theta+1 but no more than 10, and tail ends of the upper-layer metal arcs and the lower-layer metal arcs are connected via metal cylinders to form a spiral-like shape. Compared with the traditional circular polarizer, the size is small, the waveband is wide, the extinction ratio is high, manufacturing of a micro circular polarization array can be realized, integration with a linear polarization structure uniwafer is even realized, a core polarization device is provided for full-Stokes vector real-time polarization imaging, and the spiral-like metal chiral metamaterial circular polarizer can be applied to fields such as polarization imaging detection, display and laser.

Description

technical field [0001] The invention relates to a circular polarizer, in particular to a helical metal-like chiral metamaterial circular polarizer. Background technique [0002] On the one hand, polarization imaging technology can provide polarization information of objects and substances that radiometry cannot provide, and on the other hand, it has higher accuracy than radiometry. Polarization images can be used to distinguish and characterize natural targets just like grayscale images, and have important applications in meteorological and environmental scientific research, ocean development and utilization, space exploration, biomedicine, and military affairs, and are a new kind of information. Analytical methods have many advantages that traditional methods do not have. [0003] Human eyes and general detectors are "polarization blind". Without the help of any auxiliary technology, human eyes and detectors cannot directly "perceive" polarization information. The polariz...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B5/30
CPCG02B5/3025
Inventor 王少伟冀若楠刘星星陈飞良陆卫陈效双
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com