Polymer photovoltaics employing a squaraine donor additive
A polymer and donor technology, applied in photovoltaic power generation, electro-solid devices, semiconductor devices, etc., can solve the problems of difficult design and synthesis, time-consuming, short-circuit current density PCE increase, etc.
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[0090] Using 2,4-bis[4-(N,N-diisobutylamino)-2,6-dihydroxyphenyl]squaric acid (DBSQ) additive and poly(3-hexylthiophene) (P3HT) polymer Bulk materials to fabricate organic photosensitive optoelectronic devices. DBSQ absorbs strongly at wavelengths from λ=520 to 750nm and has a peak optical density of 2.0x10 at λ=700nm 5 cm -1 , while P3HT absorbs at λ=400 to 630 nm. The fabricated device has the following structure: indium tin oxide (ITO, 50nm) / poly-(3,4-ethylenedioxythiophene):polystyrenesulfonate (PEDOT:PSS, 40nm) / P3HT:[6,6] - Phenyl C61-butyric acid methyl ester (PCBM): DBSQ (140nm) / LiF 1nm) / Al (200nm). The concentration of DBSQ in the photoactive zone varied from 0, 5% and 10% by weight. The relative ratio of P3HT:PCBM is 1:0.7. The P3HT:PCBM:DBSQ blend was dissolved in chlorobenzene at a concentration of 4.0% by weight and then spin-coated to a thickness of 140 nm on an ITO layer with a sheet resistivity of 10 Ω / square. After spin-coating, the P3HT:PCBM:DBSQ layer w...
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