Aluminum film water system photoresistance stripping liquid in liquid crystal panel manufacture technology and preparation method thereof

A manufacturing process and technology for liquid crystal panels, applied in the field of aluminum film water-based photoresist stripping solution and its preparation, can solve problems such as large environmental pollution and human health damage, and achieve the effects of avoiding damage, reducing temperature, and improving photoresist stripping performance.

Inactive Publication Date: 2015-09-23
JIANGYIN JIANGHUA MICROELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] larger;
[0006] 3) Ethanolamine (MEA) and dimethyl sulfoxide (DMSO) have great environmental pollution and great harm to human health

Method used

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  • Aluminum film water system photoresistance stripping liquid in liquid crystal panel manufacture technology and preparation method thereof
  • Aluminum film water system photoresistance stripping liquid in liquid crystal panel manufacture technology and preparation method thereof
  • Aluminum film water system photoresistance stripping liquid in liquid crystal panel manufacture technology and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Embodiment 1. Weigh 11 kg of N-methylpyrrolidone, add it into a reaction kettle equipped with 5 kg of water through an automatic feeder under stirring, and fully stir at normal temperature and pressure. The stirring time is: 15 minutes. The speed is 65 rpm; 20kg of isopropanamide, 0.2kg of dimethoxyphenethylamine, 12kg of vinyl n-butyl ether, 5kg of isopropyl n-propyl sulfide, and ethylene glycol monoisopropyl ether 7kg, then add water to 100kg, stir again for 15 minutes, the stirring speed is 70 rpm; start the diaphragm pump, and circulate the prepared mixture through a 0.3um filter for 2 hours, and then filter through a 0.15μm filter , to remove harmful particles with a particle size greater than 0.15 μm in the mixture, that is, to prepare an aluminum film water-based photoresist stripping solution.

Embodiment 2

[0025] Example 2, weigh 12 kg of N-methylpyrrolidone, add it into a reaction kettle equipped with 8 kg of water through an automatic feeder under stirring, fully stir at normal temperature and pressure, and the stirring time is: 18 minutes, stirring The speed is 65 rpm; add 21kg of isopropanamide, 0.5kg of dimethoxyphenethylamine, 13kg of vinyl n-butyl ether, 6kg of isopropyl n-propyl sulfide, and ethylene glycol monoisopropyl ether 8kg, then add water to 100kg, stir again for 18 minutes, the stirring speed is 70 rpm; start the diaphragm pump, and circulate the obtained mixture through a 0.3um filter for 2 hours, and then filter through a 0.15μm filter , to remove harmful particles with a particle size greater than 0.15 μm in the mixture, that is, to prepare an aluminum film water-based photoresist stripping solution.

Embodiment 3

[0026] Example 3, weigh 13kg of N-methylpyrrolidone, add it into a reaction kettle equipped with 10kg of water through an automatic feeder under stirring, fully stir at normal temperature and pressure, the stirring time is: 20 minutes, stirring The speed is 70 rpm; 22kg of isopropanamide, 0.8kg of dimethoxyphenethylamine, 14kg of vinyl n-butyl ether, 7kg of isopropyl n-propyl sulfide, and ethylene glycol monoisopropyl ether are added at a time. 10kg, then add water to 100kg, stir again for 20 minutes, the stirring speed is 75 rpm; start the diaphragm pump, and circulate the prepared mixture through a 0.3um filter for 3 hours, and then filter through a 0.15μm filter , to remove harmful particles with a particle size greater than 0.15 μm in the mixture, that is, to prepare an aluminum film water-based photoresist stripping solution.

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Abstract

The invention discloses aluminum film water system photoresistance stripping liquid in a liquid crystal panel manufacture technology and a preparation method thereof. The aluminum film water system photoresistance stripping liquid comprises the following compositions in percentage by weight: 11-16% of N-methylpyrrolidone, 20-25% ofisopropylamide, 0.2-2.5% of dimethoxy phenethylamine, 12-17% of N-butyl vinyl ether, 5-9% of isopropyl dipropyl sulfide, 7-13% of ethylene glycol monoisopropyl ether and the balance of water. The aluminum film water system photoresistance stripping liquid and the preparation method of the aluminum film water system photoresistance stripping liquid can improve the photoresistance stripping performance of a liquid crystal panel product, lowers technological condition temperature and avoids damage on human bodies and the environment by positive photoresist stripping liquid which is originally used.

Description

technical field [0001] The invention relates to an aluminum film water-based photoresist stripping liquid in a liquid crystal panel manufacturing process and a preparation method thereof. Background technique [0002] At present, the low-temperature water-based positive glue stripper is a transparent and volatile liquid, flammable, and its density (25°C) is about 1.0g / ml. Aluminum film water-based photoresist stripping solution is mainly used for photoresist stripping in FPD (Flat Panel Display, flat panel display) panel production, and its use process temperature is about 80°C; Composed of sulfoxide (DMSO) and ultrapure water, this product mainly has the following disadvantages: [0003] 1) It is easy to attack the metal layer protected by the photoresist when the photoresist is stripped with the low-temperature water-based positive resist stripping solution, resulting in a decrease in product yield; [0004] 2) The low-temperature water-based positive glue stripping solu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
Inventor 殷福华邵勇朱龙
Owner JIANGYIN JIANGHUA MICROELECTRONICS MATERIAL
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