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Molybdenum aluminum photoresist stripping liquid in liquid crystal touch screen of transistor

A touch screen and transistor technology, which is applied in optics, photomechanical equipment, photosensitive material processing, etc., can solve the problems of large environmental pollution, human health damage, etc., and achieve the effect of reducing the temperature of process conditions, avoiding damage, and improving the stripping performance of photoresist

Inactive Publication Date: 2018-04-27
无锡长元新能源电动车科技发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] larger;
[0006] 3) Ethanolamine (MEA) and dimethyl sulfoxide (DMSO) have great environmental pollution and great harm to human health
[0007] Therefore it is necessary to provide an improved molybdenum-aluminum photoresist stripping solution and preparation method thereof, improve the photoresist stripping performance in the transistor liquid crystal touch screen manufacturing process, reduce the temperature of process conditions, and avoid the damage caused by the original positive photoresist stripping solution. Damage to humans and the environment

Method used

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  • Molybdenum aluminum photoresist stripping liquid in liquid crystal touch screen of transistor
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  • Molybdenum aluminum photoresist stripping liquid in liquid crystal touch screen of transistor

Examples

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Effect test

Embodiment 1

[0024] Example 1. Weigh 10kg of organic alcohol amine, and then slowly add it into a reaction kettle filled with appropriate deionized water through an automatic feeding system, and stir fully. The stirring temperature is 40 degrees, and the stirring pressure is 1.2Mpa. Stir The time was 10 minutes, and the stirring speed was 45 rpm;

[0025] Then take by weighing the triethanolamine solution of 12kg, the o-fluorobenzoic acid of 1.2kg, the vinyl n-butyl ether of 5kg, the isopropyl n-sulfide of 2.5kg, the aprotic solvent of 0.2kg and suitable deionized water, and Fully stir, the stirring temperature is 30 degrees, the stirring air pressure is 2.2Mpa, the stirring time is 15 minutes, and the stirring speed is 55 rpm;

[0026] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 2 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture, and then obtain molybdenum-...

Embodiment 2

[0028] Example 2. Weigh 13kg of organic alcohol amine, and then slowly add it into the reaction kettle filled with appropriate deionized water through the automatic feeding system, and fully stir. The stirring temperature is 50 degrees, and the stirring pressure is 1.7Mpa. Stir The time was 12 minutes, and the stirring speed was 45 rpm;

[0029] Then take by weighing the triethanolamine solution of 17kg, the o-fluorobenzoic acid of 2.2kg, the vinyl n-butyl ether of 10kg, the isopropyl n-sulfide of 4.5kg, the aprotic solvent of 0.4kg and suitable deionized water, and Fully stir, the stirring temperature is 35 degrees, the stirring air pressure is 2.9Mpa, the stirring time is 20 minutes, and the stirring speed is 65 rpm;

[0030] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 2.5 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture, and then obtain molyb...

Embodiment 3

[0032] Example 3. Weigh 16kg of organic alcohol amine, and then slowly add it into the reaction kettle filled with appropriate deionized water through the automatic feeding system, and fully stir. The stirring temperature is 60 degrees, and the stirring pressure is 2.3Mpa. Stir The time was 15 minutes, and the stirring speed was 45 rpm;

[0033] Then take by weighing 20kg of triethanolamine solution, 2.8kg of o-fluorobenzoic acid, 15kg of vinyl n-butyl ether, 6.9kg of isopropyl n-sulfide, 0.6kg of aprotic solvent and suitable deionized water, and Fully stir, the stirring temperature is 40 degrees, the stirring air pressure is 3.3Mpa, the stirring time is 25 minutes, and the stirring speed is 75 rpm;

[0034] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 3 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture, and then obtain molybdenum-aluminum photore...

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Abstract

The invention discloses a molybdenum aluminum photoresist stripping liquid in a liquid crystal touch screen of a transistor. The molybdenum aluminum photoresist stripping liquid comprises the following compositions based on percent by weight: 10-16% of organic hydramine, 12-20% of triethanolamine solution, 1.2-2.8% of fluorobenzoic acid, 5-15% of vinyl butyl ether, 2.5-6.9% of ester-based quaternary ammonium hydroxide and 0.2-0.6% of non-proton solvent with the balance being deionized water. With the molybdenum aluminum photoresist stripping liquid provided by the invention, the photoresist stripping performance of a liquid crystal panel product of the thin film transistor can be improved, the temperature of the process condition is reduced, and moreover, the harm to a human body and an environment caused by a positive photoresist stripping liquid which is originally used is prevented.

Description

technical field [0001] The invention relates to a molybdenum-aluminum photoresist stripping solution in a transistor liquid crystal touch screen. Background technique [0002] At present, the low-temperature water-based positive glue stripper is a transparent and volatile liquid, flammable, and its density (25°C) is about 1.0g / ml. Molybdenum-aluminum photoresist stripping solution is mainly used for photoresist stripping in the production of transistor liquid crystal touch screen panels, and its operating temperature is about 80°C; Composed of pure water, this product mainly has the following disadvantages: [0003] 1) It is easy to attack the metal layer protected by the photoresist when the photoresist is stripped with the low-temperature water-based positive resist stripping solution, resulting in a decrease in product yield; [0004] 2) The low-temperature water-based positive glue stripping solution requires a high process temperature, which needs to be heated to abou...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
CPCG03F7/422
Inventor 殷德军陈昊朱德意
Owner 无锡长元新能源电动车科技发展有限公司
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