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Aluminum film drainage photoresist stripper in thin-film liquid crystal display

A liquid crystal display, stripping liquid technology, applied in optics, instruments, opto-mechanical equipment, etc., can solve problems such as large environmental pollution, human health damage, human and environmental damage, etc., to reduce process conditions, temperature, avoid damage, and improve light. The effect of peel resistance

Inactive Publication Date: 2016-03-09
WUXI JIJIN ENVIRONMENTAL PROTECTION TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] 3) Ethanolamine (MEA) and dimethyl sulfoxide (DMSO) have great environmental pollution and great harm to human health
[0006] Therefore be necessary to provide a kind of improved aluminum film water system photoresist stripping liquid and preparation method thereof, improve the photoresist stripping performance in the thin film liquid crystal display manufacturing process, reduce process condition temperature, and avoid the positive glue stripping liquid that uses originally to cause Damage to humans and the environment

Method used

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  • Aluminum film drainage photoresist stripper in thin-film liquid crystal display
  • Aluminum film drainage photoresist stripper in thin-film liquid crystal display
  • Aluminum film drainage photoresist stripper in thin-film liquid crystal display

Examples

Experimental program
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Effect test

Embodiment 1

[0023] Embodiment 1, take by weighing the potassium hydroxide solution of 10kg, then slowly join in the reactor that suitably deionized water is filled with by automatic feeding system, and fully stir, and stirring temperature is 40 degree, and stirring air pressure is 1.2Mpa, Stirring time is 10 minutes, and the speed of stirring is 45 rpm;

[0024] Then weigh 12kg of triethanolamine solution, 1.2kg of o-fluorobenzoic acid, 5kg of vinyl n-butyl ether, 2.5kg of isopropyl n-sulfide, 0.2kg of pure sulfuric acid and appropriate deionized water, and fully stir , the stirring temperature is 30 degrees, the stirring air pressure is 2.2Mpa, the stirring time is 15 minutes, and the stirring speed is 55 rpm;

[0025] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 2 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture, and obtain an aluminum film water-based pho...

Embodiment 2

[0027] Embodiment 2, take by weighing the potassium hydroxide solution of 13kg, then slowly join in the reactor that suitably deionized water is filled with by automatic feeding system, and fully stir, stirring temperature is 50 degree, and stirring air pressure is 1.7Mpa, The stirring time was 12 minutes, and the stirring speed was 45 rpm;

[0028] Then weigh 17kg of triethanolamine solution, 2.2kg of o-fluorobenzoic acid, 10kg of vinyl n-butyl ether, 4.5kg of isopropyl n-sulfide, 0.4kg of pure sulfuric acid and appropriate deionized water, and fully stir , the stirring temperature is 35 degrees, the stirring air pressure is 2.9Mpa, the stirring time is 20 minutes, and the stirring speed is 65 rpm;

[0029] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 2.5 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture to obtain an aluminum film water-based pho...

Embodiment 3

[0031] Embodiment 3, take by weighing the potassium hydroxide solution of 16kg, then slowly join in the reactor that suitably deionized water is filled with by automatic feeding system, and fully stir, stirring temperature is 60 degree, and stirring air pressure is 2.3Mpa, The stirring time was 15 minutes, and the stirring speed was 45 rpm;

[0032] Then take by weighing 20kg of triethanolamine solution, 2.8kg of o-fluorobenzoic acid, 15kg of vinyl n-butyl ether, 6.9kg of isopropyl n-sulfide, 0.6kg of pure sulfuric acid and appropriate deionized water, and fully stir , the stirring temperature is 40 degrees, the stirring air pressure is 3.3Mpa, the stirring time is 25 minutes, and the stirring speed is 75 rpm;

[0033] Finally, start the diaphragm pump, and circulate the prepared mixture through a 0.2um filter for 3 hours, and then filter through a 0.12μm filter to remove harmful particles with a particle size larger than 0.12μm in the mixture to obtain an aluminum film water-...

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Abstract

The invention discloses an aluminum film drainage photoresist stripper in a thin-film liquid crystal display. The aluminum film drainage photoresist stripper comprises the following compositions in parts by weight: 10% to 16% of potassium hydroxide solution; 12% to 20% of triethanolamine solution; 1.2% to 2.8% of 2-fluorobenzoic acid; 5% to 15% of vinyl butyl ether; 2.5% to 6.9% of isopropyl dipropyl sulfide; 0.2% to 0.6% of pure sulfuric acid; and the rest is deionized water. The aluminum film drainage photoresist stripper provided by the invention can improve the photoresist stripping performance of thin-film liquid crystal panel products, reduce the temperature of process condition and avoid the damage to human bodies and environment by the formerly used positive photoresist stripper.

Description

technical field [0001] The invention relates to an aluminum film water-based photoresist stripping solution in a thin film liquid crystal display. Background technique [0002] At present, the low-temperature water-based positive glue stripper is a transparent and volatile liquid, flammable, and its density (25°C) is about 1.0g / ml. Aluminum film water-based photoresist stripping solution is mainly used for photoresist stripping in the production of thin-film liquid crystal display panels, and its operating temperature is about 80°C; Composed of ultrapure water, this product mainly has the following disadvantages: [0003] 1) It is easy to attack the metal layer protected by the photoresist when the photoresist is stripped with the low-temperature water-based positive resist stripping solution, resulting in a decrease in product yield; [0004] 2) The low-temperature water-based positive glue stripping solution requires a high process temperature and needs to be heated to a...

Claims

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Application Information

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IPC IPC(8): G03F7/42
CPCG03F7/425
Inventor 刘进军
Owner WUXI JIJIN ENVIRONMENTAL PROTECTION TECH CO LTD
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